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Microsystem Technologies

, Volume 14, Issue 9–11, pp 1305–1310 | Cite as

Fabrication of micro sloping structures of SU-8 by substrate penetration lithography

  • J. Onishi
  • K. Makabe
  • Y. MatsumotoEmail author
Technical Paper

Abstract

In this paper, three-dimensional (3D) micro sloping structures were fabricated by ordinary mask pattern and diffraction phenomenon. Especially, we fabricated the structures with SU-8 negative photoresist and substrate penetration lithography. In this method, exposure is performed arranging in order of a mask, a substrate and the SU-8 resist. There is a gap that is equal to the thickness of the substrate between resist and mask. In narrow slit of mask, resist is less exposed than usual because of Fraunhofer diffraction. The amount of exposure depends on slit width so that the height of SU-8 resist can be controlled. A 173 μm height of structure was obtained in the case of 27 μm width slit and 24.2 μm height of structure was obtained in the case of 7.4 μm width slit. By using this method, high aspect ratio 3D SU-8 structures with smooth sloping were fabricated in the length of 100–300 μm and in the height of 50–200 μm with rectangular triangle mask pattern. In the same way, there is influence of Fresnel diffraction on edge of aperture so that micro taper structures were fabricated. A lot of taper structures were fabricated by the method to make the surface repellency. The contact angle was achieved more than 160° in this study.

Keywords

Contact Angle PDMS Slit Width Mask Pattern Diffraction Image 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Notes

Acknowledgments

This research has been supported in part by a grant by the Research Program on Collaborative Development of Innovative Seeds by JST (Japan Science and Technology Agency).

References

  1. Ryotaro Mori, Kei Hanai, Yoshinori Matsumoto (2004) Three dimensional micro machining of SU-8 and application for PDMS micro capillaries. In: Proceedings of μ-TAS 2004, pp 333–335Google Scholar
  2. Kei Hanai, Yoshinori Matsmoto (2004) Comparison of micro chrom patterns in gray scale lithography. In: Proceedings of micromachining and microfabrication process technology, vol IX, pp 221–228Google Scholar
  3. Kitamori T, Syouji S, Baba Y, Fujita H (2008) Technology and aplication of micro chemical chip, Maruzen inc.Google Scholar
  4. Katsutoshi Ishizuka, Mika Ezoe, and Takashi Yasuda (2006) Microvalve using super-hydrophobic surface for inhibition of protein adsorption. In: Proceedings of the 23rd sensor symposium, pp 87–90Google Scholar
  5. Bico J, Marzolin C, Que’re’ D (1999) Pearl drops. Europhysics 47(2):220–226CrossRefGoogle Scholar
  6. Cassie ABD, Baxter (1944) Wettability of porous surfaces. Trans Faraday Soc 40:546–551Google Scholar

Copyright information

© Springer-Verlag 2008

Authors and Affiliations

  1. 1.Faculty of Science and Technology, Department of Applied Physics and Physico-InformaticsKeio UniversityYokohamaJapan

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