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Fabrication of large area diffraction grating using LIGA process

Abstract

X-ray imaging is a very important technology in the fields of medical, biological, inspection, material science, etc. However, it is not enough to get the clear X-ray imaging with low absorbance. We have produced a diffraction gratings for obtaining high resolution X-ray phase imaging, such as X-ray Talbot interferometer. In this X-ray Talbot interferometer, diffraction gratings were required to have a fine, high accuracy, high aspect ratio structure. Then, we succeeded to fabricate a high aspect ratio diffraction grating with a pitch of 8 μm and small area using a deep X-ray lithography technique. We discuss that the diffraction gratings having a narrow pitch and an large effective area to obtain imaging size of practical use in medical application. If the pitch of diffraction gratings were narrow, it is expected high resolution imaging for X-ray Talbot interferometer. We succeeded and fabricated the diffraction grating with pitch of 5.3 μm, Au height of 28 μm and an effective area of 60 × 60 mm2.

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Acknowledgments

This research was supported by the research project “Development of System and Technology for Advances Measurement and Analysis” from the Japan Science and Technology Agency (JST).

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Correspondence to Daiji Noda.

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Noda, D., Tanaka, M., Shimada, K. et al. Fabrication of large area diffraction grating using LIGA process. Microsyst Technol 14, 1311–1315 (2008). https://doi.org/10.1007/s00542-008-0584-5

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  • DOI: https://doi.org/10.1007/s00542-008-0584-5

Keywords

  • High Aspect Ratio
  • Diffraction Grating
  • Differential Phase Shift
  • High Aspect Ratio Structure
  • Large Effective Area