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Fabrication of large area diffraction grating using LIGA process


X-ray imaging is a very important technology in the fields of medical, biological, inspection, material science, etc. However, it is not enough to get the clear X-ray imaging with low absorbance. We have produced a diffraction gratings for obtaining high resolution X-ray phase imaging, such as X-ray Talbot interferometer. In this X-ray Talbot interferometer, diffraction gratings were required to have a fine, high accuracy, high aspect ratio structure. Then, we succeeded to fabricate a high aspect ratio diffraction grating with a pitch of 8 μm and small area using a deep X-ray lithography technique. We discuss that the diffraction gratings having a narrow pitch and an large effective area to obtain imaging size of practical use in medical application. If the pitch of diffraction gratings were narrow, it is expected high resolution imaging for X-ray Talbot interferometer. We succeeded and fabricated the diffraction grating with pitch of 5.3 μm, Au height of 28 μm and an effective area of 60 × 60 mm2.

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  • David C, Nöhammer B, Solak HH, Ziegler E (2002) Appl Phys Lett 81:3287–3289

    Article  Google Scholar 

  • Matsumoto M, Takiguchi K, Tanaka M, Funabiki Y, Takeda H, Momose A, Utsumi Y, Hattori T (2007) Microsyst Technol 13:543–546

    Article  Google Scholar 

  • Momose A (2005) Jpn J Appl Phys 44:6355–6367

    Article  Google Scholar 

  • Momose A, Kawamoto S, Koyama I, Hamaishi Y, Takai K, Suzuki Y (2003) Jpn J Appl Phys 42:L866–L868

    Article  Google Scholar 

  • Momose A, Yashiro W, Moritake M, Takeda Y, Uesugi K, Takeuchi A, Suzuki Y, Tanaka M, Hattori T (2006a) Proc Soc Photo Opt Instrum Eng 6318:63180T1–63180T10

    Google Scholar 

  • Momose A, Yashiro W, Takeda Y, Suzuki Y, Hattori T (2006b) Jpn J Appl Phys 45:5254–5262

    Article  Google Scholar 

  • Noda D, Tanaka M, Shimada K, Hattori T (2007) Jpn J Appl Phys 46:849–851

    Article  Google Scholar 

  • Pfeiffer F, Weitkamp T, Bunk O, David C (2006) Nat Phys 2:258–261

    Article  Google Scholar 

  • Tanaka M, Takeda Y, Noda D, Yashiro W, Okuda K, Momose A, Hattori T (2006) Proceedings of the 2006 international symposium on micro-nano mechatronics and human science, pp 491–496

  • Utsumi Y, Kishimoto T, Hattori T, Hara H (2007) Microsyst Technol 13:417–423

    Article  Google Scholar 

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This research was supported by the research project “Development of System and Technology for Advances Measurement and Analysis” from the Japan Science and Technology Agency (JST).

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Correspondence to Daiji Noda.

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Noda, D., Tanaka, M., Shimada, K. et al. Fabrication of large area diffraction grating using LIGA process. Microsyst Technol 14, 1311–1315 (2008).

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  • High Aspect Ratio
  • Diffraction Grating
  • Differential Phase Shift
  • High Aspect Ratio Structure
  • Large Effective Area