Advertisement

Microsystem Technologies

, Volume 14, Issue 9–11, pp 1291–1297 | Cite as

Lithography with UV-LED array for curved surface structure

  • S. SuzukiEmail author
  • Y. Matsumoto
Technical Paper

Abstract

The technology to fabricate high-aspect ratio and micro curved surface structures is needed for optical device fabrication such as micro lens, light guiding device, and so on. In this study, micro curved surface structures were fabricated by using novel lithography technique with UV-LED array and rotary stage (Hanai et al. in Proceedings of the 22nd sensor symposium, pp 516–519, 2005). Smooth surface structures can be fabricated in this technique, because UV-LED which has wide directivity characteristics makes the difference of the UV dose. In addition, the structures can be formed with high uniformity in large area by only one exposure process, because rotation reduces the unevenness of exposure. This technique can control the shapes of structures by changing exposure time and applying gray scale mask method (Waits et al. in Sensors Actuat A 119:245–253, 2005). We fabricated structures of hemisphere, semi-cylinder, and semi-cone by using this technique. High-aspect ratio structures were obtained and they had smooth curved surface. Then, they were used for micro lens fabrication. By using molding technique, micro lenses of the UV curable resin were fabricated on the silicon wafer.

Keywords

PDMS Mask Pattern Rotary Stage Exposure Process Fabrication Result 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Notes

Acknowledgments

This research was partially supported by the Ministry of Education, Science, Sports and Culture, Grant-in-Aid for Exploratory Research, 19651064, 2007.

References

  1. Hanai K, Nakahara T, Matsumoto Y (2005) Fabrication of micro overhanging structures of SU-8 by using inclined rotary exposure. In: Proceedings of the 22nd sensor symposium, pp 516–519Google Scholar
  2. Waits CM, Morgan B, Kastantin M, Ghodssi R (2005) Microfabrication of 3D silicon MEMS structures using gray-scale lithography and deep reactive ion etching. Sensors Actuat A 119:245–253CrossRefGoogle Scholar
  3. Herzig HP, Stern MB (1997) Micro-optics. Taylor & Francis Ltd, San Francisco, pp 71–77Google Scholar
  4. Hanai K, Nakahara T, Matsumoto Y (2004) Optical elements of SU-8 by using Grayscale lithography and substrate penetration method. In: Proceeding of optical MEMS 2004, pp 148–149Google Scholar

Copyright information

© Springer-Verlag 2008

Authors and Affiliations

  1. 1.Faculty of Science and Technology, Department of Applied Physics and Physico-InformaticsKeio UniversityKanagawaJapan

Personalised recommendations