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Microsystem Technologies

, Volume 14, Issue 9–11, pp 1251–1255 | Cite as

Fabrication of Fresnel zone plates with high aspect ratio by soft X-ray lithography

  • Longhua Liu
  • Gang Liu
  • Ying Xiong
  • Jie Chen
  • Chunlei Kang
  • Xinlong Huang
  • Yangchao TianEmail author
Technical Paper

Abstract

High focusing efficiency Fresnel zone plates for hard X-ray imaging is fabricated by electron beam lithography, soft X-ray lithography, and gold electroplating techniques. Using the electron beam lithography, Fresnel zone plates which has an outermost zone width of 100 nm and thickness of 250 nm has been fabricated. Fresnel zone plates with outermost zone width of 150 nm and thickness of 660 nm has been fabricated by using soft X-ray lithography.

Keywords

PMMA High Aspect Ratio Diffraction Efficiency Zone Plate MIBK 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

Notes

Acknowledgments

The authors would like to acknowledge Professor Changqing Xie and Dr. Deqiang Wang for their help and useful discussion. This work is supported by National Natural Science Foundation of China (No.10675113).

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Copyright information

© Springer-Verlag 2008

Authors and Affiliations

  • Longhua Liu
    • 1
  • Gang Liu
    • 1
  • Ying Xiong
    • 1
  • Jie Chen
    • 1
  • Chunlei Kang
    • 1
  • Xinlong Huang
    • 1
  • Yangchao Tian
    • 1
    Email author
  1. 1.National Synchrotron Radiation LaboratoryUniversity of Science and Technology of ChinaHefeiChina

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