Skip to main content
Log in

Stress engineering and mechanical properties of SU-8-layers for mechanical applications

  • Technical Paper
  • Published:
Microsystem Technologies Aims and scope Submit manuscript

Abstract

SU-8 is an essential material for manufacturing micromechanical components with high demands in aspect ratio and toughness in the area of micro-system technologies. For reproducible production of SU-8 components, e.g. polymeric AFM-cantilevers and chip carriers, a characterization sequence for the material in its raw state and in all subsequent processing steps was developed. Included in these tests were differential scanning calorimetry of the unprocessed resist, in situ monitoring of the solid content during soft bake, measurement of the stress behaviour during and after post-exposure bake as well as determination of micro-hardness and Young’s modulus at different baking and exposure conditions. The results are promising with respect to definition of a novel procedure for reproducible preparation of micromechanical components from SU-8.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Fig. 1
Fig. 2
Fig. 3
Fig. 4
Fig. 5
Fig. 6
Fig. 7
Fig. 8
Fig. 9
Fig. 10

Similar content being viewed by others

References

  • Bleidiessel G et al (1998) Dependence of the quality of thick resist structures on resist baking. Microelectronic Eng 41/42:433–436

    Article  Google Scholar 

  • BMBF-Projekt (2007) SU-8-Cantilever—design, Herstellung und Applikationen sowie mikroskalierte Kraftsensoren. Projekt Nr.: W3003/W3004, Fördernr.: 16SV2274 Zeitraum: 06/2006-09/2007

  • Desta Y (2005) Deep X-ray lithography of SU-8 photoresist: influence of process parameters and conditions. In: Proceedings of the HARMST Conference 2005, Gyeongju, Korea

  • Feldmann M, Büttgenbach S (2005) Die Einsatzmöglichkeit der UV-Tiefenlithographie bei der Entwicklung von Mikrosystemen. In: Proceedings of the Mikrosystemtechnik Kongress 2005, Freiburg

  • Flaemig J, Fuelle A, Hammacher J, Saupe J, Zahn W, Grimm J (2007) Seeing at Nanoscale V, June 2007, Santa Barbara

  • Genolet G et al (1999) Soft entirely photoplastic probes for scanning force microscopy. Rev Sci Instr 70(5):2398

    Article  Google Scholar 

  • Genolet G (2001) New photoplastic fabrication techniques and devices based on high aspect ratio photoresist. Ph.D. Dissertation No 2421, Ecole Polytechnique Fédérale de Lausanne, CH

  • Hopcroft M et al (2003) Micromechanical testing of SU-8 cantilevers, ATEM’03, JSME-MMD, Sep 10–12, p 1

  • Lee J et al (2003) Fabrication of atomic force microscope probe with low spring constant using SU-8 photoresist. Jpn J Appl Phys 42:1171

    Article  Google Scholar 

  • Löchel B et al (1996) Influence of resist baking on the pattern quality of thick photoresist. In: Pang S, Chang S (eds) Micromachining and microfabrication process technology II. Proc SPIE 2879:174–181

  • Maciossek A, Bleidiessel G, Wilbers W, Loechel B (2007) Verfahren und Vorrichtung zur Trocknung von Photoresistschichten. Patent DE 198 21 237.2

  • MicroChem Corp. (2007) Material safety data sheet, Page 3, Table 1

  • SAB-Projekt (2007) Mikromechanische SU-8-Chipträger für mikrophoniereduzierte pyroelektrische IR-Detektoren. Fördernr.: 11050/1711/Zeitraum: 07/2005–09/2007

  • Schwarzl F (1990) Polymermechanik. Springer, Berlin

    Google Scholar 

  • Schütz A (2004) Dissertation, Untersuchungen zum Einsatz des Negativresistmaterials SU-8 in der LIGA-Technik, Technische Universität Berlin 2004, D 32

  • Stoney GG (1909) The tension of metallic films deposited by electrolysis. Proc R Soc Sen Lond A 82: 172–175

    Article  Google Scholar 

Download references

Acknowledgments

The authors would like to thank all participants and contributors to this work, especially to co-workers from Westsaechsische Hochschule Zwickau. Special thanks goes to Juergen Vogel and his crew (WHZ) doing tension–expansion-measurements, to BESSY (Berlin) for the helpful discussions and particularly to Hella Scheer (University Wuppertal) for technical assistance during preparation of this paper. This work was partly supported by BMBF and SAB/Dresden.

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to J. Grimm.

Rights and permissions

Reprints and permissions

About this article

Cite this article

Hammacher, J., Fuelle, A., Flaemig, J. et al. Stress engineering and mechanical properties of SU-8-layers for mechanical applications. Microsyst Technol 14, 1515–1523 (2008). https://doi.org/10.1007/s00542-007-0534-7

Download citation

  • Received:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s00542-007-0534-7

Keywords

Navigation