Fast patterning microstructures using inkjet printing conformal masks
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The presented paper describes a novel process using inkjet printing to pattern a conformal (built-on) mask onto photoresist for further microstructure formation. The advantages of using the inkjet printing conformal mask include no Cr photomask required, suitable for non-planar substrate, scalable for large area, and extreme low cost. The ink is ejected from the inkjet print-head controlled by the inkjet system. A CAD pattern from the designer can use this process to place the pattern ink onto the photoresist substrate. A conformal mask (made of ink) was directly built-on the photoresist substrate. The dried ink thickness has to be more than 1.8 μm thick as UV absorber. Following UV exposure, development, and ink removal, the designed microstructure patterns can be realized in photoresist such as microchannels and micro-columns.
KeywordsInkjet Printing Lithography Process Dimensional Deviation Printing Speed Microstructure Patterning
This work was supported by Ministry of Economic Affairs and National Science Council (series no. 95-2221-E-005-112) of Taiwan.