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Fabrication of a polymeric tapered HARMs array utilizing a low-cost nickel electroplated mold insert

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Abstract

A simple low-cost technique has been developed to fabricate a mold insert for replicating polymeric tapered high aspect ratio microstructures. A backside exposure technique is used to first obtain a tapered sidewall structure as an electroplating mold in SU-8 photoresist on a glass wafer. Nickel electroplating is utilized to form the mold insert. The lowest average surface roughness of the nickel mold insert on the side that interfaces with the glass wafer during electroplating is measured to be 7.02 nm. A novel technique involving use of titanium putty is introduced here to reduce cost and effort required to fabricate the mold insert. Replication of tapered microstructures in polymeric materials utilizing the fabricated mold insert is demonstrated here in polydimethylsiloxane by a direct molding process and in polymethyl methacrylate by hot embossing. The fabrication details for the mold insert are described. Advantages and disadvantages of the use of titanium putty for achieving superior metal surface finish are given.

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References

  • Becher EW, Ehrfeld W, Hagmann P, Maner A, Muenchmeyer D (1986) Fabrication of microstructures with high aspect ratio and great structural heights by synchrotron radiation lithography, electroforming and plastic molding (LIGA process). Microelectron Eng 4:35–56

    Article  Google Scholar 

  • Despont M, Lorenz H, Fahrni N, Brugger J, Renaud P, Vettiger P (1997) High-aspect-ratio, ultrathick, negative-tone near-uv photoresist for MEMS applications. In: Micro Electro Mechanical Systems, 1997, MEMS ‘97, Proceedings IEEE, 10th annual international workshop, 26–30 January 1997, pp. 518–522

  • Kim K, Park DS, Lu HM, Che W, Kim K, Lee JB, Ahn CH (2004) A tapered hollow metallic microneedle array using backside exposure of SU-8. J Micromech Microeng 14:597–603

    Article  Google Scholar 

  • Peterman MC, Huie P, Bloom DM, Fishman HA (2003) Building thick photoresist structures from the bottom up. J Micromech Microeng 13:380–382

    Article  Google Scholar 

  • Turner R, Desta Y, Kelly K, Zhang J, Geiger E, Cortez S, Mancini DC (2003) Tapered LIGA HARMs. J Micromech Microeng 13:367–372

    Article  Google Scholar 

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Acknowledgments

The authors acknowledge the assistance of Mr Golden Hwaung and Mr Naga Korivi during fabrication. Any opinions, findings, and conclusions or recommendations expressed here are those of the authors.

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Correspondence to In-Hyouk Song.

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Song, IH., Jin, Y. & Ajmera, P.K. Fabrication of a polymeric tapered HARMs array utilizing a low-cost nickel electroplated mold insert. Microsyst Technol 13, 287–291 (2007). https://doi.org/10.1007/s00542-006-0212-1

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  • DOI: https://doi.org/10.1007/s00542-006-0212-1

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