Abstract
We demonstrate experimentally the X-ray lithography technique to fabricate microgratings on a PMMA plate and on curved surfaces such as PMMA cylinder lens surfaces with X-ray lithography by copper mesh as mask. Some gratings with 12.7 μm pitches on the plate and on PMMA curved surface with large area (10 mm × 10 mm) by vertically moving or rotating the resist stage exposure are realized.
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Acknowledgements
This work was supported by the Kyoto Nano Cluster Project in Japan and by NFSC Foundation (grant number 60377014) of China.
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Li, Y., Sugiyama, S. Fabrication of microgratings on PMMA plate and curved surface by using copper mesh as X-ray lithography mask. Microsyst Technol 13, 227–230 (2007). https://doi.org/10.1007/s00542-006-0196-x
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DOI: https://doi.org/10.1007/s00542-006-0196-x