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High aspect ratio microstructures based on anisotropic porous materials

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Abstract

 Structures with high aspect ratios have been prepared by exploiting the high built-in anisotropy of some porous materials. For the structuring of these materials with nearly arbitrary shapes only standard lithography and isotropic etching is needed. We demonstrate the power of this technique for macroporous silicon and porous anodic alumina. Structures with sub-micrometer precision and aspect ratios above 100 are shown.

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Authors and Affiliations

  1. Max-Planck-Institute of Microstructure Physics, Weinberg 2, D-06120 Halle, Germany E-mail: fmuel@mpi-halle.mpg.de, , , , , , DE

    F. Müller, A. Birner, J. Schilling, A.-P. Li, K. Nielsch & U. Gösele

  2. Infinion Technologies AG, Corporate Technology, Otto-Hahn-Ring 6, D-81730 München, Germany, , , , , , DE

    V. Lehmann

Authors
  1. F. Müller
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  2. A. Birner
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  3. J. Schilling
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  4. A.-P. Li
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  5. K. Nielsch
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  6. U. Gösele
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  7. V. Lehmann
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Additional information

Received: 7 July 1999/Accepted: 15 October 1999

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Müller, F., Birner, A., Schilling, J. et al. High aspect ratio microstructures based on anisotropic porous materials. Microsystem Technologies 8, 7–9 (2002). https://doi.org/10.1007/s00542-002-0047-3

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  • DOI: https://doi.org/10.1007/s00542-002-0047-3

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