Abstract
Thin films of blends of polystyrene (PS) and poly(n-butyl methacrylate) (PBMA) were prepared by spin-casting onto silicon wafers in order to map the lateral distribution of the two polymers. The surfaces were examined by atomic force microscopy (AFM) secondary ion mass spectroscopy X-ray photoelectron spectroscopy (XPS) and photoemission electron microscopy (PEEM). Films with PBMA contents of 50% w/w or less were relatively smooth, but further increase in the PBMA content produced, initially, protruding PS ribbons and then, for PBMA ≥80% w/w, isolated PS islands. At all concentrations the topmost surface (0.5–1.0 nm) was covered by PBMA, whilst the PBMA concentration in the near-surface region, measured by XPS, increased with bulk content to eventual saturation. PEEM measurements of a PS–PBMA film at the composition at which ribbon features were observed by AFM also showed a PS-rich ribbon structure surrounded by a sea of mainly PBMA.
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Received: 6 December 1999/Accepted: 5 April 2000
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Affrossman, S., Jerome, R., O'Neill, S. et al. Surface structure of thin film blends of polystyrene and poly(n -butyl methacrylate). Colloid Polym Sci 278, 993–999 (2000). https://doi.org/10.1007/s003960000358
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DOI: https://doi.org/10.1007/s003960000358