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Gas monitoring in the process industry using diode laser spectroscopy

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, CO, NH3, HCl and HF are described together with measurements from several installations. The monitors show continuous measurements with fast response and good sensitivity, all of which is difficult to obtain with conventional techniques such as wet chemical analysis.

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Authors and Affiliations

  1. Norsk Elektro Optikk A/S, Solheimv. 62 A, P.O. Box 384, N-1471 Skårer, Norway (Fax: +47 67 97 49 00, E-mail: ivar@neo.no; peter@neo.no; tycho@neo.no), , , , , , NO

    I. Linnerud, P. Kaspersen & T. Jaeger

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  1. I. Linnerud
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  2. P. Kaspersen
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  3. T. Jaeger
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Received: 19 March 1998/Revised version: 2 June 1998

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Linnerud, I., Kaspersen, P. & Jaeger, T. Gas monitoring in the process industry using diode laser spectroscopy . Appl Phys B 67, 297–305 (1998). https://doi.org/10.1007/s003400050509

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  • DOI: https://doi.org/10.1007/s003400050509

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