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Hexagonal nanostructures generated by light masks for neutral atoms

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52

Cr, different patterns can be generated. Possible applications using the inherent properties of atom lithography, e.g. the fabrication of photonic bandgap material, are discussed.

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Authors and Affiliations

  1. Universität Konstanz, Fakultät für Physik, D-78457 Konstanz, Germany, , , , , , DE

    U. Drodofsky, J. Stuhler, T. Schulze, M. Drewsen, B. Brezger, T. Pfau & J. Mlynek

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  1. U. Drodofsky
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  2. J. Stuhler
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  3. T. Schulze
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  4. M. Drewsen
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  5. B. Brezger
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  6. T. Pfau
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  7. J. Mlynek
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Received: 10 March 1997/Revised version: 12 May 1997

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Drodofsky, U., Stuhler, J., Schulze, T. et al. Hexagonal nanostructures generated by light masks for neutral atoms . Appl Phys B 65, 755–759 (1997). https://doi.org/10.1007/s003400050342

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  • DOI: https://doi.org/10.1007/s003400050342

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