Abstract
The fabrication of a metal–insulator–metal plasmon waveguide with a linear taper is reported. Highly efficient nanofocusing of light with a Au–SiO2–Au waveguide with a three-dimensional taper had been demonstrated. However, conventional vertical taper structures were fabricated with a low-throughput process based on electron beam scanning. We propose an efficient, mass-productive fabrication process using a standard dry etching technique. A key improvement is the employment of a mixed gas of CHF3 and O2. By optimizing the gas composition and the cooling process of the substrate, a SiO2 vertical taper with an angle of 19°, which is very close to the optimum 20°, was successfully produced. At the tip section, an ultra-thin waveguide as thin as 5.6 nm, only one-third of the conventional demonstration, is reproducibly realized by the employment of an atomic layer deposition of Al2O3. Coupling efficiency as high as 72 % numerically demonstrated.
Similar content being viewed by others
References
J.A. Schuller, E.S. Barnard, W. Cai, Y.C. Jun, J.S. White, M.L. Brongersma, Plasmonics for extreme light concentration and manipulation. Nature Mater. 9, 193–204 (2010)
D.K. Gramotnev, S.I. Bozhevolnyi, Plasmonics beyond the diffraction limit. Nature Photon. 4, 83–91 (2010)
M.I. Stockman, Nanofocusing of optical energy in tapered plasmonic waveguides. Phys. Rev. Lett. 93, 137404 (2004)
E. Verhagen, A. Polman, L.K. Kuipers, Nanofocusing in laterally tapered plasmonic waveguides. Opt. Express 16, 45–57 (2008)
D.P. O’Connor, Modelling of nano-optic light delivery mechanisms for use in high density data storage, Ph.D thesis, The Queen’s University of Belfast, UK (2010)
V.A. Zenin, A. Andryieuski, R. Malureanu, I.P. Radko, V.S. Volkov, D.K. Gramotnev, A.V. Lavrinenko, S.I. Bozhevolnyi, Boosting local field enhancement by on-chip nanofocusing and impedance-matched plasmonic antennas. Nano Lett. 15, 8148–8154 (2015)
S.A. Maier, Plasmonics: Fundamentals and Applications (Springer, New York, 2007)
J.A. Dionne, L.A. Sweatlock, H.A. Atwater, Plasmon slot waveguides: towards chip-scale propagation with subwavelength-scale localization. Phys. Rev. B 73, 035407 (2006)
H.T. Miyazaki, Y. Kurokawa, Squeezing visible light waves into a 3-nm-thick and 55-nm-long plasmon cavity. Phys. Rev. Lett. 96, 097401 (2006)
Y. Kurokawa, H.T. Miyazaki, Metal-insulator-metal plasmon nanocavities: analysis of optical properties. Phys. Rev. B 75, 035411 (2007)
S. Vedantam, H. Lee, J. Tang, J. Conway, M. Staffaroni, E. Yablonovitch, A plasmonic dimple lens for nanoscale focusing of light. Nano Lett. 9, 3447–3452 (2009)
H. Choo, M. Kim, M. Staffaroni, T.J. Seok, J. Bokor, S. Cabrini, P.J. Schuck, M.C. Wu, E. Yablonovitch, Nanofocusing in a metal-insulator-metal gap plasmon waveguide with a three-dimensional linear taper. Nature Photon. 6, 838–844 (2012)
T. Brenner, W. Hunziker, M. Smit, M. Bachmann, G. Guekos, H. Melchior, Vertical InP/InGaAsP tapers for low-loss optical fibre-waveguide coupling. Electron. Lett. 28, 2040–2041 (1992)
S. Ullerich, R. Steingruber, A. Umbach, Gray-tone lithography and dry etching technique for the fabrication of integrated spot size converters. Microelectron. Eng. 46, 303–306 (1999)
B. Jacobs, R. Zengerle, K. Faltin, W. Weicrshausen, Vertically tapered spot size transformers fabricated by a simple masking technique. Electron. Lett. 31, 794–796 (1995)
Z. Yang, N. Fang, A. Wu, J. Chen, M. Zhang, X. Wang, S. Zou, Fabrication and characterization of integrated three-dimensional linear taper on silicon-on-insulator. Opt. Eng. 48, 303503 (2009)
R.L. Puurunen, Surface chemistry of atomic layer deposition: a case study for the trimethylaluminum/water process. J. Appl. Phys. 97, 121301 (2005)
W. Lee, H. Yang, P.J. Reucroft, H. Soh, J. Kim, S. Woo, J. Lee, Dry patterning of copper films using an O2 plasma and hexafluoroacetylacetone. Thin Solid Films 392, 122–127 (2001)
E.D. Palik, Handbook of Optical Constants of Solids III (Academic Press, San Diego, 1998)
H. Im, K.C. Bantz, N.C. Lindquist, C.L. Haynes, S.-H. Oh, Vertically oriented sub-10-nm plasmonic nanogap arrays. Nano Lett. 10, 2231–2236 (2010)
X. Chen, H.-R. Park, M. Pelton, X. Piao, N.C. Lindquist, H. Im, Y.J. Kim, J.S. Ahn, K.J. Ahn, N. Park, D.-S. Kim, S.-H. Oh, Atomic layer lithography of wafer-scale nanogap arrays for extreme confinement of electromagnetic waves. Nat. Commun. 4, 2361 (2013)
K. Ikeda, H.T. Miyazaki, T. Kasaya, K. Yamamoto, Y. Inoue, K. Fujimura, T. Kanakugi, M. Okada, K. Hatade, S. Kitagawa, Controlled thermal emission of polarized infrared waves from arrayed plasmon nanocavities. Appl. Phys. Lett. 92, 021117 (2008)
P. Nagpal, N.C. Lindquist, S.-H. Oh, D.J. Norris, Ultrasmooth patterned metals for plasmonics and metamaterials. Science 325, 594–597 (2009)
B. Choi, M. Iwanaga, H.T. Miyazaki, K. Sakoda, Y. Sugimoto, Photoluminescence-enhanced plasmonic substrates fabricated by nanoimprint lithography. J. Micro/Nanolith. MEMS MOEMS 13, 023007 (2014)
H.T. Miyazaki, T. Kasaya, H. Oosato, Y. Sugimoto, B. Choi, M. Iwanaga, K. Sakoda, Ultraviolet-nanoimprinted packaged metasurface thermal emitters for infrared CO2 sensing. Sci. Technol. Adv. Mater. 16, 035005 (2015)
Acknowledgments
We are grateful to D. Tsuya, E. Watanabe, N. Ikeda, H. Kurosawa, Y. Nakayama, F. Uesugi, K. Morita, M. Song, K. Mitsuishi, and I. Koda for discussions and technical assistance. This study is supported by NIMS Nanofabrication Platform and NIMS Microstructural Characterization Platform in Nanotechnology Platform Project sponsored by the Ministry of Education, Culture, Sports, Science and Technology (MEXT), Japan. This work is also supported by NIMS Internship Program, Research and Research for Industry Grants (RRI), Thailand Research Fund (TRF), and Seagate (Thailand) Co., Ltd.
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Wongpanya, K., Kasaya, T., Miyazaki, H.T. et al. Mass-productive fabrication of a metal–insulator–metal plasmon waveguide with a linear taper for nanofocusing. Appl. Phys. B 122, 238 (2016). https://doi.org/10.1007/s00340-016-6515-8
Received:
Accepted:
Published:
DOI: https://doi.org/10.1007/s00340-016-6515-8