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Quasi-point incoherent ArF∗ excimer emission source at 193 nm using a laser-produced plasma

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Abstract

We have demonstrated proof-of-principle of an incoherent ArF∗ emission source with a quasi-point emission geometry using a laser-produced plasma in an Ar/F2/He/Ne mixed gas. The VUV emission characteristics, such as the emission size, were dependent on those of the plasma-initiating laser. The average emission power was 10 μW at a repetition rate of 10 Hz at 193 nm. The average power conversion efficiency of the 193-nm emission from the plasma-initiating Nd:YAG laser was 6.3×10−6. The average emission power at 193 nm was proportional to that of the plasma-initiating laser, indicating the scaling of the emission source.

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Authors and Affiliations

  1. Department of Electrical and Electronic Engineering and Photon Science Center, University of Miyazaki, Gakuen Kibanadai Nishi 1-1, Miyazaki, 889-2192, Japan

    M. Kaku, Y. Sato & S. Kubodera

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  1. M. Kaku
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  2. Y. Sato
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  3. S. Kubodera
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Correspondence to M. Kaku.

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Kaku, M., Sato, Y. & Kubodera, S. Quasi-point incoherent ArF∗ excimer emission source at 193 nm using a laser-produced plasma. Appl. Phys. B 107, 85–89 (2012). https://doi.org/10.1007/s00340-012-4906-z

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  • DOI: https://doi.org/10.1007/s00340-012-4906-z

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