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Fabrication of high-aspect-ratio sub-diffraction-limit microstructures by two-photon-absorption photopolymerization

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Abstract

Micro-cell structures with side-walls as thin as 0.70 μm and aspect ratios as high as 6.7 are fabricated by single-layer writing through two-photon-absorption (TPA) photopolymerization. The use of a moderate-numerical-aperture (N.A.) objective lens to obtain a much more elongated voxel and an in situ ultraviolet (UV) pre-exposure step to improve the sensitivity of TPA photopolymerization are the main factors responsible for the high aspect ratio and sub-diffraction-limit resolution that are achieved.

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References

  1. S. Maruo, O. Nakamura, S. Kawata: Opt. Lett. 22, 132 (1997)

    Google Scholar 

  2. S. Kawata, H.-B. Sun, T. Tanaka, K. Takada: Nature 412, 697 (2001)

    Article  CAS  PubMed  Google Scholar 

  3. H.-B. Sun, T. Kawakami, Y. Xu, J.-Y. Ye, S. Matuso, H. Misawa, M. Miwa, R. Kaneko: Opt. Lett. 25, 1110 (2000)

    Google Scholar 

  4. P. Galajda, P. Ormos: Appl. Phys. Lett. 78, 249 (2001)

    Article  Google Scholar 

  5. S. Maruo, K. Ikuta, H. Korogi: Appl. Phys. Lett. 82, 133 (2003)

    Article  Google Scholar 

  6. T. Tanaka, H.-B. Sun, S. Kawata: Appl. Phys. Lett. 80, 312 (2002)

    Article  Google Scholar 

  7. H.-B. Sun, S. Matsuo, H. Misawa: Appl. Phys. Lett. 74, 786 (1999)

    Article  Google Scholar 

  8. W. Lee, S.A. Pruzinsky, P.V. Braun: Adv. Mater. 14, 271 (2002)

    Article  Google Scholar 

  9. T.A. Taton, D.J. Norris: Nature 416, 685 (2002)

    Article  Google Scholar 

  10. J.H. Strickler, W.W. Webb: Opt. Lett. 16, 1780 (1991)

    Google Scholar 

  11. D.A. Parthenopoulos, P.M. Rentzepis: Science 245, 843 (1989)

    Google Scholar 

  12. B.H. Cumpston, S.P. Ananthavel, S. Barlow, D.L. Dyer, J.E. Ehrlich, L.L. Erskine, A.A. Heikal, S.M. Kuebler, I.-Y.S. Lee, D. McCord-Maughon, J. Qin, H. Roeckel, M. Rumi, X.-I. Wu, S.R. Marder, J.W. Perry: Nature 398, 51 (1999)

    Article  Google Scholar 

  13. P.J. Flory: Principles of Polymer Chemistry (Cornell University Press, New York 1952)

  14. H.-B. Sun, T. Tanaka, S. Kawata: Appl. Phys. Lett. 80, 3673 (2002)

    Article  Google Scholar 

  15. M. Horiyama, H.-B. Sun, M. Miwa, S. Matsuo, H. Misawa: Jpn. J. Appl. Phys. 38, L212 (1999)

  16. E.S. Wu, J.H. Strickler, W.R. Harrell, W.W. Webb: Proc. SPIE 1674, 776 (1992)

    Google Scholar 

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Correspondence to E.-Y. Pan.

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42.70.Gi; 81.05.Lg; 82.35.-x

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Pan, EY., Pu, NW., Tong, YP. et al. Fabrication of high-aspect-ratio sub-diffraction-limit microstructures by two-photon-absorption photopolymerization. Appl Phys B 77, 485–488 (2003). https://doi.org/10.1007/s00340-003-1283-7

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  • DOI: https://doi.org/10.1007/s00340-003-1283-7

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