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Spectral dynamics of narrow-band F2 laser for optical lithography

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Abstract

We describe the spectral dynamics of a line-narrowed F2 laser, based on numerical simulation by a newly developed simulation code. The results were compared with the experimental results and it was found that the code could predict well the performance of a line-narrowed operation of the F2 laser. The code was also used to obtain a guideline for the optimized operation of an injection-seeded F2 laser system. In addition, a new spectral narrowing technique for the F2 laser has been proposed and its effectiveness was evaluated by the simulation code.

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Authors and Affiliations

  1. Kyushu University, 6-10-1 Hakozaki, Higasi-ku, 812-8581, Fukuoka, Japan

    H. Tanaka, A. Takahashi, T. Okada, T. Ariga, R. Nohdomi, K. Hotta & H. Mizoguchi

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  1. H. Tanaka
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  2. A. Takahashi
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  3. T. Okada
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  4. T. Ariga
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  5. R. Nohdomi
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  6. K. Hotta
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  7. H. Mizoguchi
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Corresponding author

Correspondence to H. Tanaka.

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PACS

42.55.Lt; 42.60.By; 42.60.Fc; 33.20.Ni; 78.20.Bh

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Tanaka, H., Takahashi, A., Okada, T. et al. Spectral dynamics of narrow-band F2 laser for optical lithography. Appl Phys B 76, 735–740 (2003). https://doi.org/10.1007/s00340-003-1155-1

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  • DOI: https://doi.org/10.1007/s00340-003-1155-1

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