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Pulsed UV-laser-induced chemistry of perfluoropolyether lubricant film

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Abstract.

We investigate the molecular structure change of laser-irradiated perfluoropolyether lubricant on disk media by using mass spectroscopy. A KrF excimer laser with a wavelength of 248 nm was used to irradiate the lubricant film (2 nm) on a carbon overcoat surface. We found that two unique mass peaks emerged from the laser-irradiated lubricant mass spectra, which are attributed to OH-CHF-O(:H+)-CHF-OH and F-COO-CF2-CF2-CF2-CF2 + respectively. When thelaser fluence increases to 100 mJ/cm2, these two unique mass peaks start to be enhanced drastically while the abundance of the end group of the lubricant, CF2CH2OH, remains almost constant, indicating that the two unique species are generated from the scission and re-arrangement of the backbone ether chains. With a laser fluence beyond 140 mJ/cm2, the disk media surface damage is observable and lubricant evaporation is the main pathway.

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Received: 24 October 2001 / Accepted: 3 December 2001 / Published online: 3 May 2002

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Zhu, L., Liew, T. & Chong, T. Pulsed UV-laser-induced chemistry of perfluoropolyether lubricant film . Appl Phys A 75, 633–636 (2002). https://doi.org/10.1007/s003390101188

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  • DOI: https://doi.org/10.1007/s003390101188

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