Nanostructures produced by cluster beam lithography

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clusters with about 1000 molecules per unit charge are accelerated to up to 120 keV kinetic energy for mask projective surface bombardment. Patterning is achieved via physical as well as chemical surface erosion. Very smooth eroded surfaces result for bulk natural diamond, silicon, and glass. Polycrystalline, strongly faceted CVD diamond films are effectively planarized. Submicron structures with various wall inclinations can be generated. Atomic force microscopy of individual impact structures reveals nanometer-sized hillocks instead of craters. The collective motion of the impacted surface material is considered crucial for the cluster impact-induced nanomodifications. Atomic ion beam lithography is considered for comparison.