Abstract
The mechanism of formation of self-organized patterns on Si substrate with simultaneous co-sputtering of molybdenum by low-energy ion beam sputtering has been investigated. The experiment was carried out using a 1 keV Ar ion beam at normal incidence with different ion fluence (1016–1018 ions.cm−2). To explore the mechanism of pattern evolution in the presence of impurities (Mo atom), the morphological details of the samples with different ion fluence, as well as with respect to the distance from the Mo target were examined by atomic force microscopy (AFM). The evolution of the surface pattern depends on the ion fluence and a pattern transition from ripple to ripple + dot, and dot was observed with distance from the Mo target. RBS, XPS and XRR measurements were also carried out to understand the mechanism of the surface evolution process.
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Acknowledgements
Thankful to UGC-DAE CSR Indore for providing DC ion beam sputtering, AFM facilities and Dr. S. Balaji, IGCAR, Kalpakkam, India, for RBS measurements. Thankful to Dr. S. Pathak, UPES for helping us in preparing some of the graphics.
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All authors contributed to the study conception and design. Material preparation, data collection and analysis were performed by Dr. Kumar Navin and Prof. Sarathlal Koyiloth Vayalil. Prof. Ajay Gupta contributed in data analysis and the interpretation of data. The first draft of the manuscript was written by Kumar Navin and all authors commented and contributed on previous versions of the manuscript. All authors read and approved the final manuscript.
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Navin, K., Gupta, A. & Koyiloth Vayalil, S. Molybdenum assisted self-organized pattern formation by low energy ion beam sputtering. Appl. Phys. A 130, 316 (2024). https://doi.org/10.1007/s00339-024-07466-y
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DOI: https://doi.org/10.1007/s00339-024-07466-y