Abstract
This work presents the fabrication of Nickel oxide (NiO) Thin Film (TF) on a Si substrate through e-beam evaporation. The successful growth of the NiO TF was confirmed by field emission scanning electron microscopy analysis (thickness of ~ 375 nm for as-deposited and ~ 370 nm for annealed sample). Further, the as-deposited sample was then annealed at 400 °C in open-air conditions to investigate the improved structural and electrical properties. The X-ray diffraction analysis demonstrates the polycrystalline nature of both samples. The average crystallite size was increased from ~ 13.32 nm (as-deposited) to ~ 15.46 nm after annealing. Also, the electrical properties were examined using an Au electrode for both devices. Responsivity and detectivity values of 0.12 A/W and 3.28 × 1012 Jones, respectively, were obtained for as-deposited device, which was increased to 0.69 A/W and 10.54 × 1012 Jones, respectively, after annealing. Furthermore, the device exhibits a quick response time of 0.21 s (rise time) and 0.19 s (fall time) for as-deposited and 0.17 s (rise time) and 0.16 s (fall time) for annealed samples. These performance parameters observed in this fabricated device highlighted the suitability of NiO TF for photodetector applications.
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Acknowledgements
This work was supported by the Deanship of Scientific Research, Vice Presidency for Graduate Studies and Scientific Research, King Faisal University, Saudi Arabia [Project No: GRANT3512]. The authors are also grateful to the CoE in Advanced Material, NIT Durgapur for the FE-SEM analysis. The authors are also thankful to Science & Humanities department, Electronics and Communication department, and NIT Nagaland for providing XRD measurement, and for providing financial support.
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LTC did the preliminary literature review and fabrication of the materials. The characterization and analysis of the result were done by LTC and NKS. Finally, the preparation of the manuscript was done by LTC with the help of NKS, MWA, and MF. All the authors read and approved the finalized manuscript.
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Chanu, L.T., Alam, M.W., Farhan, M. et al. Enhanced performance of annealed NiO thin film for UV photodetection. Appl. Phys. A 129, 652 (2023). https://doi.org/10.1007/s00339-023-06936-z
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DOI: https://doi.org/10.1007/s00339-023-06936-z