Abstract
TiVCrAl films were co-sputtered from TiVCr and Al targets at room temperature. The effects of Al target power on the phase, microstructure, and mechanical, and electrical properties of the TiVCrAl films were investigated. The Al concentration in the films varied from 0 at.% to 70.3 at.% by modulating the Al target power. Results showed that all the TiVCrAl films exhibited a single body-centered cubic phase. Columnar structures became dense and featureless with the increase in Al target power because of the enhanced bombardment with sputtered species and gas ions. Moreover, valence electron concentration decreased when the Al alloys were prepared with TiVCr. Accordingly, mechanical and electrical properties improved. The incorporation of Al increased hardness and reduced electrical resistivity to 12.0 GPa and 164 μΩ·cm, respectively.
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The authors gratefully acknowledge the financial support for this research by the Ministry of Science and Technology of Taiwan under Grant No. NSC 109-2221-E-005-035-MY3. The present work was also supported in part by the Core Facility Center of the National Cheng Kung University.
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Tsai, DC., Chang, ZC., Chen, EC. et al. Influence of Al concentration on the structural and electrical properties of TiVCrAl alloy films grown via magnetron co-sputtering. Appl. Phys. A 128, 361 (2022). https://doi.org/10.1007/s00339-022-05461-9
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DOI: https://doi.org/10.1007/s00339-022-05461-9