Abstract
A radio frequency magnetron sputtering (RFMS) method was used to deposit zinc oxide (ZnO) thin films onto fluorine tin oxide (FTO) coated glass substrates at room temperature (ZnO R) and 400 °C (ZnO T). The X-ray diffraction (XRD) analysis confirms the formation of polycrystalline hexagonal wurtzite composition in ZnO R and ZnO T thin films. Field emission scanning electron microscopy (FESEM) revealed heteroepitaxial grown nanospheres in ZnO R and ZnO T thin films. The presence of multiphonon vibrations of Zn sublattice and oxygen atoms was visible in the Raman spectrum. With increased substrate temperature, the grain size of the ZnO thin films was increased from 42 to 54 nm. The cyclic voltammetry (CV) was used to characterize the step-wise electrode modification processes at the potentials of 0.5 V and 0.65 V, respectively. Chronoamperometric (CA) was carried out to quantify GA within the concentration range of 50−450 μM with sensitivity (S) = 0.0219 µA/µM and found the detection limit of (LOD) 23 nM. The electrode can able to detect different isomers of phenols. Interferences of other pollutants such as tannic acid (TA), ferulic acid (FA), syringic acid (SA), and quercetin (QT) did not affect the sensing of GA. The newly developed sensor exhibited diffusion-controlled kinetics and had excellent sensitivity, selectivity, and reproducibility for the detection of GA. The electrode showed good recoveries in real sample analysis.
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Acknowledgements
The Authors sincerely acknowledges, The DST-SERB-CRG Grant No: CRG/2019/004547, The Rashtriya Uchchatar Shiksha Abhiyan (RUSA 2.0) Bharathiar Cancer and Theragnostic Research (BCTRC), Government of INDIA for financial assistance. The Tamil Nadu State Council for Higher Education (TANSCHE) Grand No: RGP/2019-20/BU/HECP- 0024, Further, the authors sincerely admit they’re thanks to UGC-SAP, DST-PURSE and DST-FIST.
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Amir, H., Murugesan, D., Ponpandian , N. et al. ZnO-based electrochemical sensors for highly sensitive and selective detection of gallic acid at impact of substrate temperature. Appl. Phys. A 127, 802 (2021). https://doi.org/10.1007/s00339-021-04952-5
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DOI: https://doi.org/10.1007/s00339-021-04952-5