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High-fidelity large area nano-patterning of silicon with femtosecond light sheet

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Abstract

We employ a femtosecond light sheet generated by a cylindrical lens to rapidly produce high-fidelity nano-structures over large area on silicon surface. The Fourier analysis of electron microscopy images of the laser-induced surface structures reveals sharp peaks indicating good homogeneity. We observed an emergence of second-order spatial periodicity on increasing the scan speed. Our reliable approach may rapidly nano-pattern curved solid surfaces and tiny objects for diverse potential applications in optical devices, structural coloring, plasmonic substrates and in high-harmonic generation.

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Acknowledgements

We thank central facility of IISER Mohali for SEM imaging, DST and Max Planck Society for financial support. KP would also like to acknowledge A. Devi for showing initial interest.

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Authors and Affiliations

  1. Department of Physical Sciences, Indian Institute of Science Education and Research Mohali, Sector-81, Manauli, 140306, India

    Mehra S. Sidhu, Pooja Munjal & Kamal P. Singh

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  1. Mehra S. Sidhu
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  2. Pooja Munjal
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  3. Kamal P. Singh
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Correspondence to Kamal P. Singh.

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Sidhu, M.S., Munjal, P. & Singh, K.P. High-fidelity large area nano-patterning of silicon with femtosecond light sheet. Appl. Phys. A 124, 46 (2018). https://doi.org/10.1007/s00339-017-1459-3

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  • DOI: https://doi.org/10.1007/s00339-017-1459-3

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