Abstract
The reverse tunneling current of Al/SiO2/n-SiC structure employing thin gate oxide is introduced to examine the interface property by illumination. The gate current at negative bias decreases under blue LED illumination, yet increases under UV lamp illumination. Light-induced electrons captured by interface states may be emitted after the light sources are off, leading to the recovery of gate currents. Based on transient characteristics of gate current, the extracted trap level is close to the light energy for blue LED, indicating that electron capture induced by lighting may result in the reduction of gate current. Furthermore, bidirectional C–V measurements exhibit a positive voltage shift caused by electron trapping under blue LED illumination, while a negative voltage shift is observed under UV lamp illumination. Distinct trapping and detrapping behaviors can be observed from variations in I–V and C–V curves utilizing different light sources for 4H-SiC MOS capacitors with thin insulators.
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Acknowledgements
The authors would like to acknowledge the support of Ministry of Science and Technology, ROC, under Contract No. NSC 102-2221-E-002-183-MY3, and National Taiwan University under Contract No. NTU-ERP-105R89081. The authors also want to thank Hestia Power Inc. for providing the 4H-SiC epitaxial wafer.
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Chang, P.K., Hwu, J.G. Investigation of interface property in Al/SiO2/n-SiC structure with thin gate oxide by illumination. Appl. Phys. A 123, 261 (2017). https://doi.org/10.1007/s00339-017-0897-2
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DOI: https://doi.org/10.1007/s00339-017-0897-2