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Nano-patterning of gold thin film by thermal annealing combined with laser interference techniques

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Abstract

We present an efficient method for fabrication of desired periodic metallic structures. By using the magnetron sputtering technique, the gold nano-layer was isotropically deposited onto a photoresist template, which had been previously fabricated by an interference technique. During a subsequent thermal annealing process, the gold coating layer melted and split allowing the photoresist core-template to evaporate and consequently leave a desired metal structure on the substrate surface. The proposed method exhibits advantages such as simplicity and low cost, which allows one to realize large-area plasmonic structures that are very promising for numerous applications, especially plasmonic-based photonic devices.

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Acknowledgments

We are grateful to J. Lautru for his invaluable help and access to the clean room and to the use of scanning electronic microscope.

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Authors and Affiliations

  1. Laboratoire de Photonique Quantique et Moléculaire, UMR 8537, Ecole Normale Supérieure de Cachan, CentraleSupélec, CNRS, Université Paris-Saclay, 94235, Cachan, France

    Minh Thanh Do, Quang Cong Tong, Alexander Lidiak, Mai Hoang Luong, Isabelle Ledoux-Rak & Ngoc Diep Lai

  2. Hanoi National University of Education, 136 Xuan Thuy, Cau Giay, Hanoi, Vietnam

    Minh Thanh Do

  3. Institute of Materials Science, Vietnam Academy of Science and Technology, 18 Hoang Quoc Viet, Cau Giay, Hanoi, Vietnam

    Quang Cong Tong

Authors
  1. Minh Thanh Do
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  2. Quang Cong Tong
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  3. Alexander Lidiak
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  4. Mai Hoang Luong
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  5. Isabelle Ledoux-Rak
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  6. Ngoc Diep Lai
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Correspondence to Ngoc Diep Lai.

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Do, M.T., Tong, Q.C., Lidiak, A. et al. Nano-patterning of gold thin film by thermal annealing combined with laser interference techniques. Appl. Phys. A 122, 360 (2016). https://doi.org/10.1007/s00339-016-9951-8

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  • DOI: https://doi.org/10.1007/s00339-016-9951-8

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