Applied Physics A

, 122:701 | Cite as

Largest possible deviations from stoichiometry transfer during pulsed laser deposition

  • Christina Klamt
  • Arne Dittrich
  • Bea Jaquet
  • Christian Eberl
  • Florian Döring
  • Hans-Ulrich Krebs
Rapid communications

Abstract

One of the major advantages of pulsed laser deposition (PLD) is the ability to transfer complex multicomponent materials stoichiometrically from a target to the growing film on a substrate. Nevertheless, in some systems small deviations from stoichiometry were found. In this paper, we show that it is possible to grow homogeneous alloy films with concentrations over an unprecedented large range of 0–97 wt% W from a single W80Cu20 target by just varying the laser fluence and additionally tilting the substrate during deposition. This is probably the largest deviation from stoichiometry transfer possible in a binary system.

References

  1. 1.
    D.B. Chrisey, G.K. Hubler, Pulsed Laser Deposition of Thin Films (Wiley, New York, 1994)Google Scholar
  2. 2.
    R. Eason, Pulsed Laser Deposition of Thin Films (Wiley, New York, 2007)Google Scholar
  3. 3.
    S. Fähler, H.U. Krebs, Appl. Surf. Sci. 96–98, 61 (1996)CrossRefGoogle Scholar
  4. 4.
    S. Fähler, K. Sturm, H.U. Krebs, Appl. Phys. Lett. 75, 3766 (1999)ADSCrossRefGoogle Scholar
  5. 5.
    A. Perea, J. Gonzalo, C. Budtz-Joergensen, G. Epurescu, J. Siegel, C.N. Afonso, J. García-López, J. Appl. Phys. 104, 4912 (2008)CrossRefGoogle Scholar
  6. 6.
    A. Dittrich, C. Eberl, S. Schlenkrich, F. Schlenkrich, F. Döring, H.U. Krebs, Appl. Phys. A 122, 301 (2016)ADSCrossRefGoogle Scholar
  7. 7.
    J.F. O´Hanlon, A User’s Guide to Vacuum Technology (Wiley, Hoboken, 2003), p. 483CrossRefGoogle Scholar
  8. 8.
    H.U. Krebs, M. Störmer, S. Fähler, O. Bremert, M. Hamp, A. Pundt, H. Teichler, W. Blum, T.H. Metzger, Appl. Surf. Sci. 109–110, 563 (1997)CrossRefGoogle Scholar
  9. 9.
    T.N. Hansen, J. Shou, J.G. Lunney, Appl. Phys. Lett. 72, 1829 (1998)ADSCrossRefGoogle Scholar
  10. 10.
    H. Frey, G. Kienel, Dünnschichttechnologie (VDI, Düsseldorf, 1987), p. 101Google Scholar
  11. 11.
    S.P. Chou, N.M. Ghoniem, Model. Simul. Mater. Sci. Eng. 1, 731 (1993)ADSCrossRefGoogle Scholar

Copyright information

© Springer-Verlag Berlin Heidelberg 2016

Authors and Affiliations

  • Christina Klamt
    • 1
  • Arne Dittrich
    • 1
  • Bea Jaquet
    • 1
  • Christian Eberl
    • 1
  • Florian Döring
    • 1
  • Hans-Ulrich Krebs
    • 1
  1. 1.Institut für MaterialphysikGeorg-August-University GöttingenGöttingenGermany

Personalised recommendations