Applied Physics A

, Volume 121, Issue 2, pp 443–449

Nanoimprint lithography of plasmonic platforms for SERS applications

  • Steven J. Barcelo
  • Wei Wu
  • Xuema Li
  • Zhiyong Li
  • R. Stanley Williams
Invited paper

DOI: 10.1007/s00339-015-9073-8

Cite this article as:
Barcelo, S.J., Wu, W., Li, X. et al. Appl. Phys. A (2015) 121: 443. doi:10.1007/s00339-015-9073-8

Abstract

In this review, we describe the use of nanoimprint lithography in our group to fabricate plasmonic platforms with nanometer-scale critical features that would be significantly more expensive using other fabrication techniques: 3-D cones that have tips with a sub-10 nm radius of curvature, active polygonal nanofingers with sub-2 nm spacing, and deterministic nanoparticle assemblies both on arbitrary substrates and in solution. These nanostructures were primarily designed to make surface-enhanced Raman Scattering a viable analytical technique for low-level chemical and biological contaminants, but the same fabrication methods should also be useful for other nanophotonic and nanoelectronic applications.

Copyright information

© Springer-Verlag Berlin Heidelberg 2015

Authors and Affiliations

  • Steven J. Barcelo
    • 1
  • Wei Wu
    • 2
  • Xuema Li
    • 1
  • Zhiyong Li
    • 1
  • R. Stanley Williams
    • 1
  1. 1.Hewlett-Packard LaboratoriesPalo AltoUSA
  2. 2.Ming Hsieh Department of Electrical EngineeringUniversity of Southern CaliforniaLos AngelesUSA

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