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Preparation of Bi:TiO2 thin films by an hybrid deposition configuration: pulsed laser deposition and thermal evaporation

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Abstract

The aim of this work was to report the application of an hybrid deposition configuration to deposit Titanium dioxide (TiO2) thin films modified with different amounts of bismuth (Bi:TiO2). The samples were synthesized combining a TiO2 laser ablation plasma with a flux of vapor of bismuth produced by thermal evaporation. By varying the deposition rate of Bi it was possible to control the amount of Bi incorporated in the film and consequently the film properties. A detailed compositional, structural, and optical characterization by XPS, RBS, Raman spectroscopy, and UV–Vis spectrometry techniques is discussed. Photocatalytic response of the deposited thin films was studied through the degradation of a malachite green solution.

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Acknowledgments

This work was partially supported by the BisNano project (EC263878, CONACYT 125141) and CONACYT CB-168827.

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Correspondence to L. Escobar-Alarcón.

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Escobar-Alarcón, L., Solís-Casados, D.A., Perez-Alvarez, J. et al. Preparation of Bi:TiO2 thin films by an hybrid deposition configuration: pulsed laser deposition and thermal evaporation. Appl. Phys. A 117, 31–35 (2014). https://doi.org/10.1007/s00339-014-8276-8

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  • DOI: https://doi.org/10.1007/s00339-014-8276-8

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