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Optical nanolithography with λ/15 resolution using bowtie aperture array

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Abstract

We report optical parallel nanolithography using bowtie apertures with the help of the interferometric-spatial-phase-imaging (ISPI) technique. The ISPI system can detect and control the distance between the bowtie aperture, and photoresist with a resolution of sub-nanometer level. It overcomes the difficulties brought by the light divergence of bowtie apertures. Parallel nanolithography with feature size of 22 ± 5 nm is achieved. This technique combines high resolution, parallel throughput, and low cost, which is promising for practical applications.

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Acknowledgments

Support to this work by the Defense Advanced Research Projects Agency (Grant No. N66001-08-1-2037) and the National Science Foundation (Grant No. CMMI-1120577) is gratefully acknowledged. X.W. also acknowledges the support from the National Basic Research Program (973 Program) of China under Grant No. 2013CBA01703 and 2012CB921900.

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Author notes

  1. Pornsak Srisungsitthisunti

    Present address: Production Engineering Department, King Mongkut’s University of Technology North Bangkok, Bangkok, 10800, Thailand

Authors and Affiliations

  1. School of Mechanical Engineering and Birck Nanotechnology Center, Purdue University, West Lafayette, IN, 47907, USA

    Xiaolei Wen, Luis M. Traverso, Pornsak Srisungsitthisunti & Xianfan Xu

  2. Department of Optics and Optical Engineering, The University of Science and Technology of China, Hefei, 230026, Anhui, China

    Xiaolei Wen

  3. Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge, MA, 02139, USA

    Euclid E. Moon

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  1. Xiaolei Wen
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  2. Luis M. Traverso
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  4. Xianfan Xu
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  5. Euclid E. Moon
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Corresponding author

Correspondence to Xianfan Xu.

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Wen, X., Traverso, L.M., Srisungsitthisunti, P. et al. Optical nanolithography with λ/15 resolution using bowtie aperture array. Appl. Phys. A 117, 307–311 (2014). https://doi.org/10.1007/s00339-014-8265-y

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  • DOI: https://doi.org/10.1007/s00339-014-8265-y

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