Abstract
We report the fabrication of cross-linked micro/nanopatterns on ZnO by adjusting the femtosecond-laser polarizations of four-beam interference. The micro/nanopatterns are composed of two types of patterns with vertically oriented and horizontally oriented ripples, respectively. The relative locations, ablation depths and the nanoripple distributions of the two patterns can be manipulated by adjusting the laser polarizations. Theoretical calculations of the interference patterns indicate clearly that the micropatterns are determined by the interferential intensity patterns, while the nanopatterns depend on the interferential polarization patterns. The micro/nanopatterns have potential applications in micro-optical polarization diffraction elements by virtue of femtosecond-laser-induced anisotropy.
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Acknowledgements
This work is supported by the National Natural Science Foundation of China (11274116, 11104178, 11027403 and 51132004), the National Special Science Research Program of China (2010CB923203 and 2011CB808105), the Young Teacher Program of Shanghai University (shdj006) and the Scientific Research Program for the Youth Scholars (11C408).
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Jia, X., Jia, T., Zhang, S. et al. Manipulation of cross-linked micro/nanopatterns on ZnO by adjusting the femtosecond-laser polarizations of four-beam interference. Appl. Phys. A 114, 1333–1338 (2014). https://doi.org/10.1007/s00339-013-7975-x
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DOI: https://doi.org/10.1007/s00339-013-7975-x