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Sub-500-nm patterning of glass by nanosecond KrF excimer laser ablation

Abstract

The surface of flint glass of type F2 is patterned by nanosecond KrF excimer laser ablation. Strong UV absorption provides a comparatively low ablation threshold and precise ablation contours. By using a two-grating interferometer, periodic surface patterns with 330 nm period and 100 nm modulation depth are obtained. This method enables the fabrication of 7 mm×13 mm wide grating areas with perfectly aligned grooves without the need of high-precision sample positioning. By double exposure, crossed gratings with adjustable depths in the two orthogonal directions can be generated.

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Correspondence to J. Ihlemann.

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Bekesi, J., Meinertz, J., Simon, P. et al. Sub-500-nm patterning of glass by nanosecond KrF excimer laser ablation. Appl. Phys. A 110, 17–21 (2013). https://doi.org/10.1007/s00339-012-7313-8

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Keywords

  • Modulation Depth
  • Ablation Rate
  • Focal Line
  • Surface Relief Grating
  • Average Fluence