Skip to main content
SpringerLink
Log in

Sub-500-nm patterning of glass by nanosecond KrF excimer laser ablation

  • Rapid communication
  • Published:
Applied Physics A Aims and scope Submit manuscript

Abstract

The surface of flint glass of type F2 is patterned by nanosecond KrF excimer laser ablation. Strong UV absorption provides a comparatively low ablation threshold and precise ablation contours. By using a two-grating interferometer, periodic surface patterns with 330 nm period and 100 nm modulation depth are obtained. This method enables the fabrication of 7 mm×13 mm wide grating areas with perfectly aligned grooves without the need of high-precision sample positioning. By double exposure, crossed gratings with adjustable depths in the two orthogonal directions can be generated.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Fig. 1
Fig. 2
Fig. 3
Fig. 4
Fig. 5

References

  1. A.A. Tseng, Y.-T. Chen, C.-L. Chao, K.-J. Ma, T.P. Chen, Opt. Lasers Eng. 45, 975 (2007)

    Article  Google Scholar 

  2. B. Keiper, H. Exner, U. Löschner, T. Kuntze, J. Laser Appl. 12, 189 (2000)

    Article  ADS  Google Scholar 

  3. S. Pissadakis, L. Reekie, M. Hempstead, M.N. Zervas, J.S. Wilkinson, Appl. Phys. A 69, S739 (1999)

    Article  ADS  Google Scholar 

  4. J. Ihlemann, M. Schulz-Ruhtenberg, T. Fricke-Begemann, J. Phys. Conf. Ser. 59, 206 (2007)

    Article  ADS  Google Scholar 

  5. J. Ihlemann, S. Müller, S. Puschmann, D. Schäfer, M. Wei, J. Li, P.R. Herman, Appl. Phys. A 76, 751 (2003)

    Article  ADS  Google Scholar 

  6. S.R. Jackson, W.J. Metheringham, P.E. Dyer, Appl. Surf. Sci. 86, 223 (1995)

    Article  ADS  Google Scholar 

  7. K. Kawamura, N. Sarukura, M. Hirano, N. Ito, H. Hosono, Appl. Phys. Lett. 79, 1228 (2001)

    Article  ADS  Google Scholar 

  8. X. Ding, Y. Kawaguchi, T. Sato, A. Narazaki, R. Kurosaki, H. Niino, J. Photochem. Photobiol. A, Chem. 166, 129 (2004)

    Article  Google Scholar 

  9. B. Hopp, C. Vass, T. Smausz, Z. Bor, J. Phys. D, Appl. Phys. 39, 4843 (2006)

    Article  ADS  Google Scholar 

  10. J. Ihlemann, Appl. Phys. A 93, 65 (2008)

    Article  ADS  Google Scholar 

  11. B. Wolff-Rottke, H. Schmidt, J. Ihlemann, Microstructuring of glass with excimer lasers, in Laser Treatment of Materials, ed. by B.L. Mordike (DGM Informationsgesellschaft mbH, Oberursel, 1992), p. 615. ISBN 3-88355-185-6

    Google Scholar 

  12. C. Contardi, E.R. Taylor, A. Fu, J. Non-Cryst. Solids 291, 113 (2001)

    Article  ADS  Google Scholar 

  13. J. Békési, J. Meinertz, J. Ihlemann, P. Simon, J. Laser Micro Nanoeng. 2, 221 (2007)

    Article  Google Scholar 

  14. J. Békési, J. Meinertz, J. Ihlemann, P. Simon, Appl. Phys. A 93, 27 (2008)

    Article  ADS  Google Scholar 

  15. P. Zahariev, N. Mechkarov, G. Danev, J. Ihlemann, Appl. Phys. A 95, 639 (2009)

    Article  ADS  Google Scholar 

  16. P.E. Dyer, S.M. Maswadi, C.D. Walton, M. Ersoz, P.D.I. Fletcher, V.N. Paunov, Appl. Phys. A 77, 391 (2003)

    Article  ADS  Google Scholar 

  17. P.E. Dyer, C.D. Walton, Appl. Phys. A 79, 721 (2004)

    Article  ADS  Google Scholar 

  18. Schott Datenblatt F2 620364.360, 22 February 2007

Download references

Author information

Authors and Affiliations

  1. Laser-Laboratorium Göttingen e.V., Hans-Adolf-Krebs-Weg 1, 37077, Göttingen, Germany

    J. Bekesi, J. Meinertz, P. Simon & J. Ihlemann

Authors
  1. J. Bekesi
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. J. Meinertz
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. P. Simon
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. J. Ihlemann
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding author

Correspondence to J. Ihlemann.

Rights and permissions

Reprints and permissions

About this article

Cite this article

Bekesi, J., Meinertz, J., Simon, P. et al. Sub-500-nm patterning of glass by nanosecond KrF excimer laser ablation. Appl. Phys. A 110, 17–21 (2013). https://doi.org/10.1007/s00339-012-7313-8

Download citation

  • Received:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s00339-012-7313-8

Keywords

Search

Navigation