Skip to main content

Advertisement

SpringerLink
Log in

Room-temperature deposition of transparent conductive Al-doped ZnO thin films using low energy ion bombardment

  • Published:
Applied Physics A Aims and scope Submit manuscript

Abstract

Al-doped zinc oxide (AZO) films are prepared on quartz substrates by dual-ion-beam sputtering deposition at room temperature (∼25°C). An assisting argon ion beam (ion energy E i =0–300 eV) directly bombards the substrate surface to modify the properties of AZO films. The effects of assisted-ion beam energy on the characteristics of AZO films were investigated in terms of X-ray diffraction, atomic force microscopy, Raman spectra, Hall measurement and optical transmittance. With increasing assisting-ion beam bombardment, AZO films have a strong improved crystalline quality and increased radiation damage such as oxygen vacancies and zinc interstitials. The lowest resistivity of 4.9×10−3Ω cm and highest transmittance of above 85% in the visible region were obtained under the assisting-ion beam energy 200 eV. It was found that the bandgap of AZO films increased from 3.37 to 3.59 eV when the assisting-ion beam energy increased from 0 to 300 eV.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Fig. 1
Fig. 2
Fig. 3
Fig. 4
Fig. 5
Fig. 6

Similar content being viewed by others

References

  1. C.Y. Huang, J.H. Sun, T.T. Wu, Appl. Phys. Lett. 97, 031913 (2010)

    Article  ADS  Google Scholar 

  2. T.K. Gupta, J. Am. Ceram. Soc. 73, 1817–1840 (1990)

    Article  Google Scholar 

  3. B. Szyszka, Thin Solid Films 351, 164–169 (1999)

    Article  ADS  Google Scholar 

  4. E.M.C. Fortunato, P.M.C. Barquinha, A.C.M.B.G. Pimentel, A.M.F. Gonçalves, A.J.S. Marques, R.F.P. Martins, L.M.N. Pereira, Appl. Phys. Lett. 85, 254113 (2004)

    Google Scholar 

  5. K. Ellmer, A. Klein, B. Rech, in Transparent Conductive Zinc Oxide, ed. by R. Hull et al. Springer Series in Materials Science, vol. 104 (Springer, Heidelberg, 2008)

    Chapter  Google Scholar 

  6. C.J. Tun, J.K. Sheu, B.J. Pong, M.L. Lee, M.Y. Lee, C.K. Hsieh, C.C. Hu, G.C. Chi, IEEE Photonics Technol. Lett. 18, 274 (2006)

    Article  ADS  Google Scholar 

  7. P.F. Carcia, R.S. Mclean, M.H. Reilly, Z.G. Li, L.J. Pillione, R.F. Messier, Appl. Phys. Lett. 81, 1800 (2002)

    Article  ADS  Google Scholar 

  8. T.W. Kelley, P.F. Baude, C. Gerlach, D.E. Ender, D. Muyres, M.A. Haase, D.E. Vogel, S.D. Theiss, Chem. Mater. 16, 4413 (2004)

    Article  Google Scholar 

  9. I. Petrov, P.B. Batma, L. Hultman, J.E. Greene, J. Vac. Sci. Technol. A 21, S117 (2003)

    Article  ADS  Google Scholar 

  10. R.J. Hong, X. Jiang, G. Heide, B. Szyszka, V. Sittinger, W. Werner, J. Cryst. Growth 249, 461 (2003)

    Article  ADS  Google Scholar 

  11. N.W. Schmidt, T.S. Totushek, W.A. Kimes, D.R. Callender, J.R. Doyle, J. Appl. Phys. 94, 5514 (2003)

    Article  ADS  Google Scholar 

  12. K.H. Kim, K.C. Park, D.Y. Ma, J. Appl. Phys. 81, 7764 (1997)

    Article  ADS  Google Scholar 

  13. S.M. Park, T. Ikegami, K. Ebihara, P.K. Shin, Appl. Surf. Sci. 253, 1522 (2006)

    Article  ADS  Google Scholar 

  14. S.J. Lim, S.K. Lee, M. Jo, C.S. Lee, S. Kwon, H. Kim, J. Korean Phys. Soc. 53, 253 (2008)

    Google Scholar 

  15. J. Hu, R.G. Gordon, J. Appl. Phys. 71, 880 (1992)

    Article  ADS  Google Scholar 

  16. S. Oda, H. Tokunaga, N. Kitajima, J.I. Hanna, I. Shimizu, H. Kokado, Jpn. J. Appl. Phys. 24, 1607 (1985)

    Article  ADS  Google Scholar 

  17. D. Kim, H. Kim, K. Jang, S. Park, K. Pillai, J. Yi, J. Electrochem. Soc. 158(4), D191–D195 (2011)

    Article  Google Scholar 

  18. M. Tzolov, N. Tzenov, D. Dimova-Malinovska, M. Kalizova, C. Pizzuto, G. Vitali, G. Zollo, I. Ivanov, Thin Solid Films 379, 28 (2000)

    Article  ADS  Google Scholar 

  19. K.A. Alim, V.A. Fonoberov, A.A. Balandin, Appl. Phys. Lett. 86, 053103 (2005)

    Article  ADS  Google Scholar 

  20. C.J. Youn, T.S. Jeong, M.S. Han, J.H. Kim, J. Cryst. Growth 261, 526 (2004)

    Article  ADS  Google Scholar 

  21. J.N. Zeng, J.K. Low, Z.M. Ren, T. Liew, Y.F. Lu, Appl. Surf. Sci. 197, 362 (2002)

    Article  ADS  Google Scholar 

  22. R.A. Asmar, J.P. Atanas, M. Ajaka, Y. Zaatar, G. Ferblantier, J.L. Sauvajol, J. Jabbour, S. Juillaget, A. Foucaran, J. Cryst. Growth 279, 394 (2005)

    Article  ADS  Google Scholar 

  23. G.J. Exarhos, S.K. Sharma, Thin Solid Films 270, 27 (1995)

    Article  ADS  Google Scholar 

  24. R. Ruppin, J. Phys. C 8, 1969 (1975)

    Article  ADS  Google Scholar 

  25. P.A. Knipp, T.L. Reinecke, Phys. Rev. B 46 (1992)

  26. J. Di Gregorio, T. Furtak, Solid State Commun. 89, 163 (1994)

    Article  Google Scholar 

  27. A. Kuroyanagi, J. Appl. Phys. 66, 5492 (1989)

    Article  ADS  Google Scholar 

  28. J.Y. Seto, J. Appl. Phys. 46, 5247 (1975)

    Article  ADS  Google Scholar 

  29. N. Ito, Y. Sato, P.K. Song, A. Kaijio, K. Inoue, Y. Shigesato, Thin Solid Films 496, 99 (2006)

    Article  ADS  Google Scholar 

  30. H. Hartnagel, Semiconducting Transparent Thin Films (Institute of Physics Pub., Bristol [England], 1995)

    Google Scholar 

Download references

Acknowledgements

This work is supported by the National Natural Science Foundation of China (No. 10975106), the Science & Technology Plan Program of Suzhou City, Jiangsu Province, China (SYJG0901), the Students Innovative Experiment Plan Program of Soochow University, China (5731500910), Qing Lan Project, A Project Funded by the Priority Academic Program Development of Jiangsu Higher Education Institutions, Natural Science Foundation of Jiangsu Province for the Higher Education Institutions (11KJB140011), and The Program for graduates Research & Innovation in University of Jiangsu Province (No. CXZZ11_0085).

Author information

Authors and Affiliations

  1. Department of Physics, Soochow University, Soochow, 215006, China

    C. G. Jin, T. Yu, F. Wang, M. Z. Wu & X. M. Wu

  2. The Key Laboratory of Thin Films of Jiangsu, Soochow University, Soochow, 215006, China

    C. G. Jin, T. Yu, F. Wang, L. J. Zhuge & X. M. Wu

  3. Yancheng Institute of Technology, Yancheng, 224003, China

    Z. F. Wu

  4. Wenzheng College of Soochow University, Soochow, 215006, China

    Y. Y. Wang & Y. M. Yu

  5. Analysis and Testing Center, Soochow University, Soochow, 215006, China

    L. J. Zhuge

Authors
  1. C. G. Jin
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. T. Yu
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. Z. F. Wu
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. F. Wang
    View author publications

    You can also search for this author in PubMed Google Scholar

  5. M. Z. Wu
    View author publications

    You can also search for this author in PubMed Google Scholar

  6. Y. Y. Wang
    View author publications

    You can also search for this author in PubMed Google Scholar

  7. Y. M. Yu
    View author publications

    You can also search for this author in PubMed Google Scholar

  8. L. J. Zhuge
    View author publications

    You can also search for this author in PubMed Google Scholar

  9. X. M. Wu
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding authors

Correspondence to L. J. Zhuge or X. M. Wu.

Rights and permissions

Reprints and permissions

About this article

Cite this article

Jin, C.G., Yu, T., Wu, Z.F. et al. Room-temperature deposition of transparent conductive Al-doped ZnO thin films using low energy ion bombardment. Appl. Phys. A 106, 961–966 (2012). https://doi.org/10.1007/s00339-011-6722-4

Download citation

  • Received:

  • Accepted:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1007/s00339-011-6722-4

Keywords

Search

Navigation