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Dispersion of laser droplets using H+ ions and annealing effect on pulsed laser deposited nickel ferrite thin films

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Abstract

Nickel ferrite thin films were deposited by a pulsed laser deposition (PLD) technique on silicon substrate at room temperature in a vacuum of 5×10−5 mbar. The films were subjected to different annealing temperatures from 300–900°C and were also exposed to single shot energetic hydrogen ions using a Dense Plasma Focus (DPF) device. The changes induced in the films exposed at different distances from the top of the anode were investigated. The structural, morphological and magnetic properties of the annealed and exposed samples were investigated. X-ray diffraction (XRD) studies reveal the presence of a single phase of nickel ferrite after annealing. SEM micrographs indicate an increase in the grain size, both on annealing as well as on exposure to hydrogen ions. Annealing and hydrogen ion irradiation induced an enhancement in the magnetic moments. Laser droplets which are inherent in films deposited by laser ablation were found to be dispersed as a result of single shot hydrogen ion irradiation from the DPF.

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Authors and Affiliations

  1. Department of Physics, Atma Ram Sanatan Dharma College, University of Delhi, New Delhi, 110021, India

    Rakesh Malik

  2. Department of Physics and Astrophysics, University of Delhi, Delhi, 110 007, India

    S. Annapoorni

  3. Indira Gandhi National Open University, Maidangarhi, Delhi, 110 068, India

    S. Lamba

  4. National Institute of Education, Nanyang Technological University, Singapore, Singapore

    S. Mahmood & R. S. Rawat

Authors
  1. Rakesh Malik
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  2. S. Annapoorni
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  3. S. Lamba
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  4. S. Mahmood
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  5. R. S. Rawat
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Correspondence to S. Annapoorni.

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Malik, R., Annapoorni, S., Lamba, S. et al. Dispersion of laser droplets using H+ ions and annealing effect on pulsed laser deposited nickel ferrite thin films. Appl. Phys. A 105, 233–238 (2011). https://doi.org/10.1007/s00339-011-6495-9

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  • DOI: https://doi.org/10.1007/s00339-011-6495-9

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