Applied Physics A

, Volume 104, Issue 2, pp 583–586 | Cite as

Structural and magnetic properties of Mn-doped anatase TiO2 films synthesized by atomic layer deposition



Mn-doped anatase TiO2 (Mn: 1.2, 2.4 at%) thin films were grown on Si(100) via atomic layer deposition (ALD). The synthesis utilized Ti(OCH(CH3)2)4 and H2O as ALD precursors and Mn(DPM)3 as a dopant source. X-ray photoelectron spectroscopy measurements indicate that Mn is successfully doped in the TiO2 matrix and reveal information about film composition and elemental chemical states. Microstructure, crystallinity, and density were investigated with scanning electron microscopy, X-ray diffraction, and X-ray reflectivity. All ALD-synthesized films exhibited room-temperature ferromagnetism; the microstructure, density, and magnetic field-dependent magnetization of the TiO2 varied with the concentration of Mn. ALD permits precise composition and thickness control, and much higher process throughput compared to alternative techniques.


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  1. 1.
    S.A. Chambers, Surf. Sci. Rep. 61, 345 (2006) ADSCrossRefGoogle Scholar
  2. 2.
    S.A. Wolf, D.D. Awschalom, R.A. Buhrman, J.M. Daughton, S. von Molnar, M.L. Roukes, A.Y. Chtchelkanova, D.M. Treger, Science 294, 1488 (2001) ADSCrossRefGoogle Scholar
  3. 3.
    T. Droubay, S.M. Heald, V. Shutthanandan, S. Thevuthasan, S.A. Chambers, J. Osterwalder, J. Appl. Phys. 97, 046103 (2005) ADSCrossRefGoogle Scholar
  4. 4.
    Z. Wang, J. Tang, Y. Chen, L. Spinu, W. Zhou, L.D. Tung, J. Appl. Phys. 95, 7384 (2004) ADSCrossRefGoogle Scholar
  5. 5.
    K.Y.S. Chan, G.K.L. Goh, Thin Solid Films 516, 5582 (2008) ADSCrossRefGoogle Scholar
  6. 6.
    Y. Matsumoto, M. Murakami, T. Shono, T. Hasegawa, T. Fukumura, M. Kawasaki, P. Ahmet, T. Chikyow, S. Koshihara, H. Koinuma, Science 291, 854 (2001) ADSCrossRefGoogle Scholar
  7. 7.
    N.H. Hong, J. Sakai, A. Ruyter, V. Brize, Appl. Phys. Lett. 89, 252504 (2006) ADSCrossRefGoogle Scholar
  8. 8.
    X.Y. Li, S.X. Wu, L.M. Xu, C.T. Li, Y.J. Liu, X.J. Xing, S.W. Li, Mater. Sci. Eng. B 156, 90 (2009) CrossRefGoogle Scholar
  9. 9.
    H.S. Hsu, J.C.A. Huang, S.F. Chen, C.P. Liu, Appl. Phys. Lett. 90, 102506 (2007) ADSCrossRefGoogle Scholar
  10. 10.
    S. Banerjee, K. Rajendran, N. Gayathri, M. Sardar, S. Senthilkumar, V. Sengodan, arXiv:0704.3541v3 (2008)
  11. 11.
    A. Wojcik, M. Godlewski, E. Guziewicz, K. Kopalko, R. Jakiela, M. Kiecana, M. Sawicki, M. Guziewicz, M. Putkonen, L. Niinisto, Y. Dumont, N. Keller, Appl. Phys. Lett. 90, 082502 (2007) ADSCrossRefGoogle Scholar
  12. 12.
    S. Duhalde, C.E.R. Torres, M.F. Vignolo, F. Golmar, C. Chillote, A.F. Cabrera, F.H. Sanchez, J. Phys. Conf. Ser. 59, 479 (2007) ADSCrossRefGoogle Scholar
  13. 13.
    X. Li, S. Wu, P. Hu, X. Xing, Y. Liu, Y. Yu, M. Yang, J. Lu, S. Li, W. Liu, J. Appl. Phys. 106, 043913 (2009) ADSCrossRefGoogle Scholar
  14. 14.
    F. Hirose, M. Ito, K. Kurita, Jpn. J. Appl. Phys. 47, 5619 (2008) ADSCrossRefGoogle Scholar
  15. 15.
    J.F. Moudler, W.F. Stickle, P.E. Sobol, K.D. Bomben, Handbook of X-Ray Photoelectron Spectroscopy (Perkin-Elmer, Eden Prairie, 1992) Google Scholar
  16. 16.
    J. Zhu, Z. Deng, F. Chen, J. Zhang, H. Chen, M. Anpo, J. Huang, L. Zhang, Appl. Catal. B 62, 329 (2006) ADSCrossRefGoogle Scholar
  17. 17.
    Y. Xu, B. Lei, L. Guo, W. Zhou, Y. Liu, J. Hazard. Mater. 160, 78 (2008) CrossRefGoogle Scholar
  18. 18.
    K. Jiang, A. Zakutayev, J. Stowers, M.D. Anderson, J. Tate, D.H. McIntyre, D.C. Johnson, D.A. Keszler, Solid State Sci. 11, 1692 (2009) ADSCrossRefGoogle Scholar
  19. 19.
    S.J. Wang, W.-T. Chang, J.-Y. Ciou, M.-K. Wei, M.S. Wong, J. Vac. Sci. Technol. A 26, 898 (2008) CrossRefGoogle Scholar
  20. 20.
    C. Sima, C. Grigoriu, Thin Solid Films 518, 1314 (2009) ADSCrossRefGoogle Scholar
  21. 21.
    C.M. Wang, J. Meinhardt, P. Löbmann, J. Sol-Gel Sci. Technol. 53, 148 (2010) CrossRefGoogle Scholar
  22. 22.
    J.P. Xu, J.F. Wang, Y.B. Lin, X.C. Liu, Z.L. Lu, Z.H. Lu, L.Y. Lv, F.M. Zhang, Y.W. Du, J. Phys. D, Appl. Phys. 40, 4757 (2007) ADSCrossRefGoogle Scholar

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© Springer-Verlag 2011

Authors and Affiliations

  1. 1.Department of Chemical & Biomolecular EngineeringUniversity of IllinoisUrbanaUSA

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