Abstract
We present a new fabrication technique to produce three-dimensional (3D) microstructures on crystalline substrate using selective ion implantation and chemical etching. Localized lattice-damage layers at the specified depth beneath the substrate surface are formed by selective ion implantation. After etching out the partial surface regions and the buried lattice-damage layers by chemical etching, the 3D crystalline microstructures are produced. This technique is demonstrated on LiNbO3 crystal to produce undercutting and free-standing microstructures, including microwire, microring, and microdisk. The measurement results of micro-Raman spectra show that the used fabrication process does not affect the original crystalline structure. The features of this technique include smooth structure surface, large undercutting range, and auto-etching stop. By using multiple implantations or repeating the proposed process several times, versatile 3D crystalline microstructures can be produced.
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Wang, TJ., Tsou, YH., Chang, WC. et al. Fabrication of three-dimensional crystalline microstructures by selective ion implantation and chemical etching. Appl. Phys. A 102, 463–467 (2011). https://doi.org/10.1007/s00339-010-6241-8
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DOI: https://doi.org/10.1007/s00339-010-6241-8