Abstract
The focusing properties of a one-dimensional multilayer Laue lens (MLL) were investigated using monochromatic soft X-ray radiation from a table-top, laser-produced plasma source. The MLL was fabricated by a focused ion beam (FIB) structuring of pulsed laser deposited ZrO2/Ti multilayers. This novel method offers the potential to overcome limitations encountered in electron lithographic processes. Utilizing this multilayer Laue lens, a line focus of XUV radiation from a laser-induced plasma in a nitrogen gas puff target could be generated. The evaluated focal length is close to the designed value of 220 μm for the measurement wavelength of 2.88 nm. Divergence angle and beam waist diameter are measured by a moving knife edge and a far-field experiment, determining all relevant second-order moments based beam parameters. The waist diameter has been found to be approximately 370 nm (FWHM).
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References
D. Attwood, Soft X-rays and Extreme Ultraviolet Radiation (Cambridge University Press, Cambridge, 1999)
J. Thieme, G. Schmahl, D. Rudolph, E. Umbach, X-ray Microscopy and Spectromicroscopy (Springer, Berlin, 1998)
G. Schmahl, D. Rudolph, B. Niemann, AIP Conf. Proc. 75, 225 (1981)
C. David, B. Kaulich, R. Medenwaldt, M. Hettwer, N. Fay, M. Diehl, J. Thieme, G. Schmahl, J. Vac. Sci. Technol. B 13, 2762 (1995)
W. Chao, J. Kim, S. Rekawa, P. Fischer, E.H. Anderson, Opt. Express 17, 17699 (2009)
N. Kamijo, Y. Suzuki, H. Takano, S. Tamura, M. Yasumoto, A. Takeuchi, M. Awaji, Rev. Sci. Instrum. 74, 5101 (2003)
S. Tamura, M. Yasumoto, N. Kamijo, K. Uesugi, A. Takeuchi, Y. Terada, Y. Suzuki, J. Phys. Conf. Ser. 186, 012075 (2009)
H.C. Kang, G.B. Stephenson, C. Liu, R. Conley, R. Khachatryan, M. Wieczorek, A.T. Macrander, H. Yan, J. Maser, J. Hiller, R. Koritala, Rev. Sci. Instrum. 78, 046103 (2007)
T. Liese, V. Radisch, H.-U. Krebs, Rev. Sci. Instrum. 81, 073710 (2010)
T. Liese, V. Radisch, I. Knorr, M. Reese, P. Großmann, K. Mann, H.U. Krebs, doi:10.1016/j.apsusc.2010.10.076
S. Kranzusch, C. Peth, K. Mann, Rev. Sci. Instrum. 74(2), 969 (2003)
C. Peth, F. Barkusky, K. Mann, J. Phys. D, Appl. Phys. 41, 105202 (2008)
H.U. Krebs, O. Bremert, Appl. Phys. Lett. 62, 2341 (1993)
D. Proch, T. Trickl, Rev. Sci. Instrum. 60, 713 (1989)
ISO/FDIS 11146:1999(E), Lasers and laser-related equipment—test methods for laser beam parameters—beam widths, divergence angles and beam propagation factor (1999)
M.D. Abramoff, P.J. Magelhaes, S.J. Ram, Biophotonics Int. 11(7), 36–42 (2004)
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Open Access This is an open access article distributed under the terms of the Creative Commons Attribution Noncommercial License (https://creativecommons.org/licenses/by-nc/2.0), which permits any noncommercial use, distribution, and reproduction in any medium, provided the original author(s) and source are credited.
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Reese, M., Schäfer, B., Großmann, P. et al. Submicron focusing of XUV radiation from a laser plasma source using a multilayer Laue lens. Appl. Phys. A 102, 85–90 (2011). https://doi.org/10.1007/s00339-010-6148-4
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DOI: https://doi.org/10.1007/s00339-010-6148-4