Abstract
BiFeO3(BFO) thin films of about 200 nm in thickness have been successfully grown on oxide bottom electrode, LaNiO3(LNO), via pulsed laser ablation. X-ray diffraction spectrum of the as-deposited BFO film reveals a (100) preferred textured structure. The morphology of the BFO film is found to be strongly dependent on oxygen partial pressure in laser ablation. A saturated hysteresis loop with remanent polarization of 42 μC/cm2 and coercive field of 100 kV/cm is obtained at the film deposition at 50 mTorr. The dielectric properties have also been obtained based on the influence of the oxygen pressure.
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R. Ramesh, N.A. Spaldin, Nat. Mater. 6, 21 (2007)
J.F. Scott, Nat. Mater. 6, 256 (2007)
W. Eerenstein, N.D. Mathur, J.F. Scott, Nat. Mater. 442, 759 (2006)
P. Ravindran, R. Vidya, A. Kjekshus, H. Fjellvag, O. Eriksson, Phys. Rev. B 74, 224412 (2006)
S.V. Kiselev, R.P. Ozerov, G.S. Zhdanov, Sov. Phys. Dokl. 7, 742 (1963)
P. Fischer, M. Polomska, I. Sosnowska, M. Szymanski, J. Phys. C 13, 1931 (1980)
C. Ederer, N.A. Spaldin, Phys. Rev. B 71, 060401(R) (2005)
J.B. Neaton, C. Ederer, U.V. Waghmare, N.A. Spaldin, K.M. Rabe, Phys. Rev. B 71, 014113 (2005)
D. Lebeugle, D. Colson, A. Forget, M. Viret, Appl. Phys. Lett. 91, 022907 (2007)
D. Lebeugle, D. Colson, A. Forget, M. Viret, P. Bonville, J.F. Marucco, S. Fusil, Phys. Rev. B 76, 024116 (2007)
V.V. Shvartsman, W. Kleemann, R. Haumont, J. Kreisel, Appl. Phys. Lett. 90, 172115 (2007)
N.A. Spaldin, M. Fiebig, Science 309, 391 (2005)
H. Béa, M. Bibes, A. Barthélémy, K. Bouzehouane, E. Jacquet, A. Khodan, J.-P. Contour, S. Fusil, F. Wyczisk, A. Forget, D. Lebeugle, D. Colson, M. Viret, Appl. Phys. Lett. 87, 072508 (2005)
H. Béa, M. Bibes, S. Fusil, K. Bouzehouane, E. Jacquet, K. Rode, P. Bencok, A. Barthélémy, Phys. Rev. B 74, 020101(R) (2006)
S.Y. Yang, F. Zavaliche, L. Mohaddes-Ardabili, Appl. Phys. Lett. 87, 102903 (2005)
K.Y. Yun, M. Noda, M. Okuyama, Appl. Phys. Lett. 83, 3981 (2003)
L. You, N.T. Chua, K. Yao, L. Chen, J.L. Wang, Phys. Rev. B 80, 024105 (2009)
T.J. Zhu, L. Lu, C.V. Thompson, J. Cryst. Growth 273, 172 (2004)
Y.H. Lee, J.M. Wu, C.H. Lai, Appl. Phys. Lett. 88, 042903 (2006)
J. Wu, G. Kang, H. Liu, J. Wang, Appl. Phys. Lett. 94, 172906 (2009)
N.M. Murari, R. Thomas, S.P. Pavunny, J.R. Calzada, R.S. Katiyar, Appl. Phys. Lett. 94, 142907 (2009)
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Yan, F., Zhu, T.J., Lai, M.O. et al. Influence of oxygen pressure on the ferroelectric properties of BiFeO3 thin films on LaNiO3/Si substrates via laser ablation. Appl. Phys. A 101, 651–654 (2010). https://doi.org/10.1007/s00339-010-5918-3
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DOI: https://doi.org/10.1007/s00339-010-5918-3