Abstract
A new method for simple and economic fabrication of diffractive optical elements (DOEs) with three and four phase levels, by UV nanosecond (ns) laser ablation is presented. The technique is based on the combination of two sequentially generated complementary 2-level phase elements. During the fabrication, complete ablative removal of a highly absorbing silicon suboxide layer by pixelated backside illumination ensures the necessary high precision and optical quality. Full functionality of the new DOEs is demonstrated by fabricating micro-structures using UV femtosecond pulses.
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Open Access This is an open access article distributed under the terms of the Creative Commons Attribution Noncommercial License ( https://creativecommons.org/licenses/by-nc/2.0 ), which permits any noncommercial use, distribution, and reproduction in any medium, provided the original author(s) and source are credited.
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Kaakkunen, J.J.J., Bekesi, J., Ihlemann, J. et al. Ablation of microstructures applying diffractive elements and UV femtosecond laser pulses. Appl. Phys. A 101, 225–229 (2010). https://doi.org/10.1007/s00339-010-5824-8
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DOI: https://doi.org/10.1007/s00339-010-5824-8