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Surface phenomena involved in the formation of Co nanoparticles on amorphous carbon and SiO2 deposited by magnetron sputtering

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Abstract

High-pressure DC magnetron sputtering was used for the deposition of cobalt on amorphous carbon (a-C) and SiO2. Deposition conditions, substrate surface morphology and annealing parameters are investigated in order to promote the synthesis of large arrays of nanoparticles, with regular size and shape. Uniformly distributed Co nanoparticles a few nanometers in size were formed under annealing at 700°C in H2. Particle nucleation and growth are discussed based on X-ray photoelectron spectroscopy, transmission and scanning electron microscopy and kinetic Monte Carlo modeling (KMC).

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Authors and Affiliations

  1. Research Center in Physics of Matter and Radiation (PMR), Laboratoire d’Analyse par Réactions Nucléaires (LARN), University of Namur (FUNDP), Rue de Bruxelles, 61, 5000, Namur, Belgium

    Stéphane Lucas, Jean-François Colomer, Pavel Moskovkin & Nicolas Moreau

  2. Laboratory of Analytic and Inorganic Chemistry (LCIA), University of Mons-Hainaut (UMH), Av. Nicolas Copernic 1, 7000, Mons, Belgium

    Carla Bittencourt

Authors
  1. Stéphane Lucas
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  2. Jean-François Colomer
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  3. Carla Bittencourt
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  4. Pavel Moskovkin
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  5. Nicolas Moreau
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Correspondence to Nicolas Moreau.

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Lucas, S., Colomer, JF., Bittencourt, C. et al. Surface phenomena involved in the formation of Co nanoparticles on amorphous carbon and SiO2 deposited by magnetron sputtering. Appl. Phys. A 99, 125–138 (2010). https://doi.org/10.1007/s00339-010-5566-7

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  • DOI: https://doi.org/10.1007/s00339-010-5566-7

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