Abstract
Surface modification of PMMA and FEP polymers using extreme ultraviolet (EUV) in two spectral ranges was investigated. A laser-plasma EUV source based on a double stream gas puff target equipped with an Au coated ellipsoidal collector was used for the experiment. The spectrum of the focused radiation from Kr plasma consisted of a narrow feature with a maximum at 10 nm and a long-wavelength tail up to 70 nm. Al and Zr filters were employed for the selection of radiation from these two spectral regions. The radiation fluences in the two cases were comparable. Polymer samples were mounted in the focal plane of the EUV collector and irradiated for 1–2 min with a 10 Hz repetition rate. Weak ablation accompanied by creation of micro- and nanostructures of different kinds was obtained in both cases. Significant differences in the surface structures after irradiation of PMMA and FEP in these two spectral regions were revealed.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
L. Bacakova, V. Mares, V. Lisa, V. Svorcik, Biomaterials 21, 1173–1179 (2000)
M. Collaud Coen, R. Lehmann, P. Groening, L. Schlapbach, Appl. Surf. Sci. 207, 276–286 (2003)
T. Lippert, Adv. Polym. Sci. 168, 51–246 (2004)
T. Gumpenberger, J. Heitz, D. Bauerle, H. Kahr, I. Graz, C. Romanin, V. Svorcik, F. Leisch, Biomaterials 24, 5139–5144 (2003)
R. Mikulikova, S. Moritz, T. Gumpenberger, M. Olbrich, C. Romanin, L. Bacakova, V. Svorcik, J. Heitz, Biomaterials 26, 5572–5580 (2005)
Y. Zhang, T. Katoh, M. Washio, H. Yamada, S. Hamada, Appl. Phys. Lett. 67, 872 (1995)
H. Nagai, M. Inayoshi, M. Hori, T. Goto, M. Hiramatsu, Appl. Surf. Sci. 183, 284–289 (2001)
A. Bartnik, H. Fiedorowicz, R. Jarocki, L. Juha, J. Kostecki, R. Rakowski, M. Szczurek, Appl. Phys. B 82, 529–532 (2006)
N.S. Murthy, R.D. Prabhu, J.J. Martin, L. Zhou, R.L. Headrick, J. Appl. Phys. 100, 023538 (2006)
B. Hopp, Zs. Bor, E. Homolya, E. Mihalik, Appl. Surf. Sci. 109/110, 232–235 (1997)
T. Mocek, B. Rus, M. Stupka, M. Kozlova, A.R. Prag, J. Polan, Appl. Phys. Lett. 89, 051501 (2006)
L. Juha, M. Bittner, D. Chvostova, J. Krasa, Z. Otcenasek, A.R. Prag, J. Ullschmied, Appl. Phys. Lett. 86, 034109 (2005)
J. Chalupsky, L. Juha, J. Kuba, J. Cihelka, V. Hájková, S. Koptyaev, J. Krása, A. Velyhan, M. Bergh, C. Caleman, J. Hajdu, R.M. Bionta, H. Chapman, S.P. Hau-Riege, R.A. London, M. Jurek, J. Krzywinski, R. Nietubyc, J.B. Pelka, R. Sobierajski, J. Meyer-ter-Vehn, A. Tronnier, K. Sokolowski-Tinten, N. Stojanovic, K. Tiedtke, S. Toleikis, T. Tschentscher, H. Wabnitz, U. Zastrau, Opt. Express 15, 6036–6043 (2007)
J. Chalupsky, L. Juha, V. Hájková, J. Cihelka, L. Vyšín, J. Gautier, J. Hajdu, S.P. Hau-Riege, M. Jurek, J. Krzywinski, R.A. London, E. Papalazarou, J.B. Pelka, G. Rey, S. Sebban, R. Sobierajski, N. Stojanovic, K. Tiedtke, S. Toleikis, T. Tschentscher, C. Valentin, H. Wabnitz, P. Zeitoun, Opt. Express 17, 208–217 (2009)
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
About this article
Cite this article
Bartnik, A., Fiedorowicz, H., Jarocki, R. et al. PMMA and FEP surface modifications induced with EUV pulses in two selected wavelength ranges. Appl. Phys. A 98, 61 (2010). https://doi.org/10.1007/s00339-009-5406-9
Received:
Accepted:
Published:
DOI: https://doi.org/10.1007/s00339-009-5406-9