Abstract
Silicon–germanium epitaxially grown on silicon in the form of two-dimensional (quantum wells) and three-dimensional (quantum dots) nanostructures exhibits photoluminescence and electroluminescence in the technologically important spectral range of 1.3–1.6 μm. Until recently, the major roadblocks for practical applications of these devices were strong thermal quenching of the luminescence quantum efficiency, and a long carrier radiative lifetime. This paper summarizes recent progress in the understanding of carrier recombination in Si/SiGe nanostructures and presents a potential new route toward CMOS compatible light emitters for on-chip optical interconnects.
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References
N. Savage, IEEE Spectrum 39(8), 32 (2002)
B. Mukherjee, IEEE J. Sel. Areas Commun. 18, 1810 (2000)
D.V. Plant, A.G. Kirk, Proc. IEEE 88, 806 (2000)
D.A.B. Miller, Proc. IEEE 88, 728 (2000)
D.A.B. Miller, L. Edward, IEEE J. Sel. Top. Quantum Electron. 6, 1312 (2000)
H. Wada, T. Kamijoh, IEEE Photonics Technol. Lett. 8, 173 (1996)
M. Razeghi, M. Defour, R. Blondeau, F. Omnes, P. Maurel, O. Acher, F. Brillouet, J.C. C-Fan, J. Salerno, Appl. Phys. Lett. 53, 2389 (1988)
H. Park, A. Fang, S. Kodama, J. Bowers, Opt. Express 13, 9460 (2005)
A.W. Fang, H. Park, O. Cohen, R. Jones, M.J. Paniccia, J.E. Bowers, Opt. Express 14, 9203 (2006)
L. Pavesi, D.J. Lockwood, Silicon Photonics (Springer, Berlin, 2004), p. 397
Y. Kanemitsu, Phys. Rep. 263, 1 (1995)
K.D. Hirschman, L. Tsybeskov, S.P. Duttagupta, P.M. Fauchet, Nature 384, 338 (1996)
A.G. Cullis, L.T. Canham, P.D.J. Calcott, J. Appl. Phys. 82, 909 (1997)
Z.H. Lu, D.J. Lockwood, J.-M. Baribeau, Nature 378, 258 (1995)
L. Tsybeskov, D.J. Lockwood, in Semiconductor Nanocrystals: From Basic Principles to Applications, ed. by A.L. Efros, D.J. Lockwood, L. Tsybeskov (Kluwer Academics/Plenum, New York, 2003), pp. 209–229
G.F. Grom, D.J. Lockwood, J.P. McCaffrey, H.J. Labbe, P.M. Fauchet, B. White, J. Diener, D. Kovalev, F. Koch, L. Tsybeskov, Nature 407, 358 (2000)
L. Tsybeskov, K.D. Hirschman, S.P. Duttagupta, M. Zacharias, P.M. Fauchet, J.P. McCaffrey, D.J. Lockwood, Appl. Phys. Lett. 72, 43 (1998)
L. Pavesi, L. Dal Negro, C. Mazzoleni, G. Franzo, F. Priolo, Nature 408, 440 (2000)
S. Schuppler, S.L. Friedman, M.A. Marcus, D.L. Adler, Y.-H. Xie, F.M. Ross, Y.J. Chabal, T.D. Harris, L.E. Brus, W.L. Brown, E.E. Chaban, P.F. Szajowski, S.B. Christman, P.H. Citrin, Phys. Rev. B 52, 4910 (1995)
S. Coffa, G. Franzò, F. Priolo, Appl. Phys. Lett. 69, 2077 (1996)
S. Fukatsu, N. Usami, Y. Shiraki, A. Nishida, K. Nakagawa, Appl. Phys. Lett. 63, 967 (1993)
L. Vescan, T. Stoica, J. Lumin. 80, 485 (1998)
D. Leong, M. Harry, K.J. Reeson, K.P. Homewood, Nature 387, 686 (1997)
N. Fraj, I. Saïdi, S. Ben Radhia, K. Boujdaria, J. Appl. Phys. 102, 053703 (2007)
J. Weber, M.I. Alonso, Phys. Rev. B 40, 8 (1989)
T.D. Steiner, R.L. Hengehold, Y.K. Yeo, D.J. Godbey, P.E. Thompson, G.S. Pomrenke, J. Vac. Sci. Technol. B 10, 924 (1992)
H. Presting, M. Jaros, G. Abstreiter, Proc. SPIE 1512, 250 (1991)
J.C. Strum, H. Manoharan, L.C. Lenchyshyn, M.L.W. Thealt, N.L. Rowell, J.-P. Noel, D.C. Houghton, Phys. Rev. Lett. 66, 1362 (1991)
F.K. LeGoues, B.S. Meyerson, J.F. Morar, Phys. Rev. Lett. 66, 2903 (1991)
P. Zaumseil, G.G. Fischer, K. Brunner, K. Eberl, J. Appl. Phys. 81, 6134 (1997)
D.J. Eaglesham, M. Cerullo, Phys. Rev. Lett. 64, 1943 (1990)
Y.-W. Mo, D.E. Savage, B.S. Swartzentruber, M.G. Lagally, Phys. Rev. Lett. 65, 1020 (1990)
D.E. Savage, F. Liu, V. Zielasek, M.G. Lagaly, in Germanium Silicon: Growth and Materials, ed. by R. Hull, J.C. Bean. Semiconductor and Semimetals, vol. 56 (Academic, New York, 1999), pp. 49–96
B. Voigtländer, A. Zinner, Appl. Phys. Lett. 63, 3055 (1993)
J.A. Floro, E. Chason, L.B. Freund, R.D. Twesten, R.Q. Hwang, G.A. Lucadamo, Phys. Rev. B 59, 1990 (1999)
D.E. Jesson, S.J. Pennycook, J.Z. Tischler, J.D. Budai, J.-M. Baribeau, D.C. Houghton, Phys. Rev. Lett. 70, 2293 (1993)
Y. Shiraki, A. Sakai, Surf. Sci. Rep. 59, 153 (2005)
T.I. Kamins, E.C. Carr, R.S. Williams, S.J. Rosner, J. Appl. Phys. 81, 211 (1997)
P. Schittenhelm, M. Gail, J. Brunner, J.F. Nützel, G. Abstreiter, Appl. Phys. Lett. 67, 1292 (1995)
R. Apetz, L. Vescan, A. Hartmann, C. Dieker, H. Lüth, Appl. Phys. Lett. 66, 445 (1995)
O.G. Schmidt, C. Lange, K. Eberl, Appl. Phys. Lett. 75, 1905 (1999)
B.V. Kamenev, L. Tsybeskov, J.-M. Baribeau, D.J. Lockwood, Appl. Phys. Lett. 84, 1293 (2004)
C.G. Van de Walle, R.M. Martin, Phys. Rev. B 34, 5621 (1986)
P. Schittenhelm, C. Engel, F. Findeis, G. Abstreiter, A.A. Darhuber, G. Bauer, A.O. Kosogov, P. Werner, J. Vac. Sci. Technol. B 16, 1575 (1998)
M. El Kurdi, S. Sauvage, G. Fishman, P. Boucaud, Phys. Rev. B 73, 195327 (2006)
B.V. Kamenev, L. Tsybeskov, J.-M. Baribeau, D.J. Lockwood, Phys. Rev. B 72, 193306 (2005)
J.-M. Baribeau, N.L. Rowell, D.J. Lockwood, J. Mat. Res. 20, 3278 (2005)
J.-M. Baribeau, X. Wu, D.J. Lockwood, J. Vac. Sci. Technol. A 24, 663 (2006)
J.-M. Baribeau, X. Wu, M.-J. Picard, D.J. Lockwood, in Group IV Semiconductor Nanostructures—2006, ed. by L. Tsybeskov, D.J. Lockwood, C. Delerue, M. Ichikawa, A.W. van Buuren (MRS, Pittsburgh, 2007), p. 119
D.J. Lockwood, X. Wu, J.-M. Baribeau, IEEE Trans. Nanotechnol. 6, 245 (2007)
B.V. Kamenev, H. Grebel, L. Tsybeskov, T.I. Kamins, R.S. Williams, J.-M. Baribeau, D.J. Lockwood, Appl. Phys. Lett. 83, 5035 (2003)
M.I. Alonso, K. Winer, Phys. Rev. B 39, 10056 (1989)
F. Cerdeira, C.J. Buchenauer, F.H. Pollak, M. Cardona, Phys. Rev. B 5, 580 (1972)
S.C. Jain, B. Dietrich, H. Richter, A. Atkinson, A.H. Harker, Phys. Rev. B 52, 6247 (1995)
J.E. Smith Jr., M.H. Brodsky, B.L. Crowder, M.I. Nathan, A. Pinczuk, Phys. Rev. Lett. 26, 642 (1971)
L.P. Tilly, P.M. Mooney, J.O. Chu, F.K. LeGoues, Appl. Phys. Lett. 67, 2488 (1995)
S. Bozzo, J.-L. Lazzari, G. Bremond, J. Derrien, Thin Solid Films 380, 130 (2000)
O.G. Schmidt, K. Eberl, Phys. Rev. B 61, 13721 (2000)
K. Brunner, Rep. Prog. Phys. 6, 27 (2002)
L.C. Lenchyshyn, M.L.W. Thewalt, J.C. Sturm, P.V. Schwartz, E.J. Prinz, N.L. Rowell, J.-P. Noël, D.C. Houghton, Appl. Phys. Lett. 60, 3174 (1992)
T. Baier, U. Mantz, K. Thonke, R. Sauer, F. Schäffler, H.-J. Herzog, Phys. Rev. B 50, 15191 (1994)
J. Hu, X.G. Xu, J.A.H. Stotz, S.P. Watkins, A.E. Curzon, M.L.W. Thewalt, N. Matine, C.R. Bolognesi, Appl. Phys. Lett. 73, 2799 (1998)
J. Wan, G.L. Jin, Z.M. Jiang, Y.H. Luo, J.L. Liu, K.L. Wang, Appl. Phys. Lett. 78, 1763 (2001)
P.A. Cain, H. Ahmed, D.A. Williams, J.M. Bonar, Appl. Phys. Lett. 77, 3415 (2000)
B.V. Kamenev, E.-K. Lee, H.-Y. Chang, H. Han, H. Grebel, L. Tsybeskov, T.I. Kamins, Appl. Phys. Lett. 89, 153106 (2006)
E.-K. Lee, L. Tsybeskov, T.I. Kamins, Appl. Phys. Lett. 92, 033110 (2008)
H. Qin, A.W. Holleitner, K. Eber, R.H. Blick, Phys. Rev. B 64, 241302 (2001)
C.J. Williams, E. Corbin, M. Jaros, D.C. Herbert, Physica B 254, 240 (1998)
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Tsybeskov, L., Lee, EK., Chang, HY. et al. Silicon–germanium nanostructures for on-chip optical interconnects. Appl. Phys. A 95, 1015–1027 (2009). https://doi.org/10.1007/s00339-009-5111-8
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DOI: https://doi.org/10.1007/s00339-009-5111-8