Abstract
The diffusion of nitrogen in α-Hf was studied in the temperature range of (823–1123) K using the ion implantation and nuclear resonance techniques. The measurements show that the diffusion coefficients follow the Arrhenius behavior D(T)=D 0exp (−Q/RT) with D 0=(5.5±2.1)×10−7 m2/s and Q=(228±1) kJ/mol. A comparison of the present results with the previous one is done.
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Bregolin, F.L., Behar, M. & Dyment, F. Diffusion study of nitrogen implanted into α-Hf using the nuclear resonance technique. Appl. Phys. A 95, 501–505 (2009). https://doi.org/10.1007/s00339-008-4927-y
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DOI: https://doi.org/10.1007/s00339-008-4927-y