Abstract
The diffusion of 18O in α-Tiwas studied in the 623–873 K temperature range by using the ion implantation and nuclear resonance techniques. The measurements show that the diffusion coefficients follow an Arrhenius behavior with diffusion parameters D0=(2±1)10-7 m2 s-1 and Q=(±) 16950kJ/mol, values typical of interstitial diffusion mechanism. A comparison of the present and previous results is also done.
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66.30.Jt; 85.40.Ry
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Bregolin, F., Behar, M. & Dyment, F. Diffusion study of 18O implanted into α-Ti using the nuclear resonance technique. Appl. Phys. A 86, 481–484 (2007). https://doi.org/10.1007/s00339-006-3782-y
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DOI: https://doi.org/10.1007/s00339-006-3782-y