Abstract
The structural, optical and dc electrical properties of MgxAl1-x (0.2≤x≤0.9) gradient thin films covered with Pd/Mg are investigated before and after exposure to hydrogen. We use hydrogenography, a novel high-throughput optical technique, to map simultaneously all the hydride forming compositions and the kinetics thereof in the gradient thin film. Metallic Mg in the MgxAl1-x layer undergoes a metal-to-semiconductor transition and MgH2 is formed for all Mg fractions x investigated. The presence of an amorphous Mg-Al phase in the thin film phase diagram enhances strongly the kinetics of hydrogenation. In the Al-rich part of the film, a complex H-induced segregation of MgH2 and Al occurs. This uncommon large-scale segregation is evidenced by metal and hydrogen profiling using Rutherford backscattering spectrometry and resonant nuclear analysis based on the reaction 1H(15N,αγ)12C. Besides MgH2, an additional semiconducting phase is found by electrical conductivity measurements around an atomic [Al]/[Mg] ratio of 2 (x=0.33). This suggests that the film is partially transformed into Mg(AlH4)2 at around this composition.
Similar content being viewed by others
References
L. Schlapbach, A. Züttel, Nature 414, 353 (2001)
R. Gremaud, A. Borgschulte, W. Lohstroh, H. Schreuders, A. Züttel, B. Dam, R. Griessen, J. Alloys Compd. 404–406, 775 (2005)
M. Pasturel, M. Slaman, H. Schreuders, J.H. Rector, D.M. Borsa, B. Dam, R. Griessen, accepted in J. Appl. Phys. (2006)
A. Peles, J.A. Alford, Z. Ma, L. Yang, M.Y. Chou, Phys. Rev. B 70, 165105 (2004)
T.J. Richardson, J.L. Slack, R.D. Armitage, R. Kostecki, B. Farangis, M.D. Rubin, Appl. Phys. Lett. 78, 1 (2001)
J.L.M. van Mechelen, B. Noheda, W. Lohstroh, R.J. Westerwaal, J.H. Rector, B. Dam, R. Griessen, Appl. Phys. Lett. 84, 3653 (2004)
W. Lohstroh, R.J. Westerwaal, B. Noheda, S. Enache, I.A.M.E. Giebels, B. Dam, R. Griessen, Phys. Rev. Lett. 93, 197404 (2004)
M.J. van Setten, G.A. de Wijs, V.A. Popa, G. Brocks, Phys. Rev. B 72, 073107 (2005)
O.M. Løvvik, P.N. Nolin, Phys. Rev. B 72, 073201 (2005)
O.M. Løvvik, Phys. Rev. B 71, 144111 (2005)
A. Borgschulte, R.J. Westerwaal, J.H. Rector, B. Dam, R. Griessen, Appl. Phys. Lett. 85, 4884 (2004)
A. Krozer, B. Kasemo, J. Less Common Met. 160, 323 (1990)
A. Zaluska, L. Zaluski, J.O. Ström-Olsen, J. Alloys Compd. 288, 217 (1999)
G. Liang, J. Huot, S. Boily, A. van Neste, R. Schulz, J. Alloys Compd. 292, 247 (1999)
J.F. Pelletier, J. Huot, M. Sutton, R. Schulz, A.R. Sandy, L.B. Lurio, S.G.J. Mochrie, Phys. Rev. B 63, 052103 (2001)
W. Oelerich, T. Klassen, R. Bormann, J. Alloys Compd. 315, 237, (2001)
Y. Song, X. Guo, R. Yang, Phys. Rev. B 69, 094205 (2004)
A. Zaluska, L. Zaluski, J.O. Ström-Olsen, Appl. Phys. A 72, 157 (2001)
S. Bouaricha, J.P. Dodelet, D. Guay, J. Huot, S. Boily, R. Schulz, J. Alloys Compd. 297, 282 (2000)
B. Bogdanovic, R.A. Brand, A. Marjanovic, M. Schwickardi, J. Alloys Compd. 302, 36 (2000)
A. Züttel, P. Wenger, S. Rentsch, P. Sudan, P. Mauron, C. Emmenneger, J. Power Sources 118 1 (2003)
B.C. Hauback, H.W. Brinks, H. Fjellvåg, J. Alloys Compd. 346, 184 (2002)
H.W. Brinks, B.C. Hauback, J. Alloys Compd. 354, 143 (2003)
H. Morioka, K. Kakizaki, S. Chung, A. Yamada, J. Alloys Compd. 353, 310 (2003)
M. Fichtner, O. Fuhr, J. Alloys Compd. 345, 286 (2002)
M. Fichtner, J. Engel, O. Fuhr, A. Gloess, O. Rubner, R. Ahlrich, Inorg. Chem. 42, 7060 (2003)
L.J. Van der Pauw, Philips Res. Rep. 13, 1 (1958)
A.T.M. van Gogh, D.G. Nagengast, E.S. Kooij, N.J. Koeman, J.H. Rector, R. Griessen, Phys. Rev. B 63, 195105 (2001)
L.R. Doolittle, Nucl. Instrum. Methods Phys. Res. B 15, 227 (1985)
http://www.genplot.com
L.C. Feldman, J.W. Mayer, Fundamentals of Surface and Thin Film Analysis (Elsevier, New York, 1986)
W. Lanford, H. Trautvetter, J. Ziegler, J. Keller, Appl. Phys. Lett. 28, 566 (1976)
J.F. Ziegler, The Stopping and Ranges of Ions in Matter, in Handbook of Stopping Cross-Sections for Energetics Ions in all Elements (Pergamon Press, New York, 1980), Vol. 5
W.K. Chu, J.W. Mayer, M.A. Nicolet, Backscattering Spectrometry (Academic Press, New York, 1978)
B. Hjörvarsson, H. Rydén, T. Ericsson, E. Karlsson, Nucl. Instrum. Methods Phys. Res. B 42, 257 (1989)
D.R. Lide, CRC Handbook of Chemistry and Physics (CRC Press, Boca Raton, 2005)
P. Claudy, B. Bonnetot, J.M. Letoffe, Thermochim. Acta 27, 205 (1978)
J.N. Huiberts, R. Griessen, J.H. Rector, R.J. Wijngaarden, J.P. Dekker, D.G. de Groot, N.J. Koeman, Nature 380, 231 (1996)
I. A.M.E. Giebels, J. Isidorsson, R. Griessen, Phys. Rev. B 69, 205111 (2004)
S. Enache, W. Lohstroh, R. Griessen, Phys. Rev. B 69, 115326 (2004)
N.F. Mott, H. Jones, The Theory of the Properties of Metals and Alloys (Dover Pub, London, 1936)
R.W. Klaffky, N.S. Mohan, D.H. Damon, J. Phys. Chem. Solids, 36, 1147 (1975)
R.D. Arnell, R.I. Bates, Vacuum 43, 105 (1992)
G. Friedlmeier, M. Groll, J. Alloys Compd. 253, 550 (1997)
C.J. Smithells, Smithells Metals Reference Book (7th Ed.) (Butterworth-Heinemann, Oxford, 1992)
Y. Adda, J. Philibert, La diffusion dans les solides (Presses Universitaires de France, Paris, 1966)
J. Isidorsson, I.A.M.E. Giebels, H. Arwin, R. Griessen, Phys. Rev. B 68, 115112 (2003)
E. Johansson, Synthesis and Characterization of Potential Hydrogen Storage Materials (Acta Universitatis Upsaliensis, Uppsala, 2004)
J. Rydén, B. Hörvarsson, T. Ericsson, E. Karlsson, A. Krozer, B. Kasemo, J. Less Common Met. 152, 295 (1989)
K. Higuchi, H. Kajioka, K. Toiyama, H. Fujii, S. Orimo, Y. Kikuchi, J. Alloys Compd. 293–295, 484 (1996)
F.G. Heisenberg, D.A. Zagnoli, J.J. Sheridan, J. Less Common Met. 74, 323 (1980)
P. Hjort, A. Krozer, B. Kasemo, J. Alloys Compd. 237, 74 (1996)
G.A. Niklasson, C.G. Granqvist, Appl. Phys. 55, 3382 (1984)
D. Stauffer, A. Aharony, Introduction to Percolation Theory (Taylor and Francis, London, 1994)
S. Kirkpatrick, Rev. Mod. Phys. 45, 574 (1973)
Author information
Authors and Affiliations
Corresponding author
Additional information
PACS
78.20.-e; 68.55.-a; 64.75.+g
Rights and permissions
About this article
Cite this article
Gremaud, R., Borgschulte, A., Chacon, C. et al. Structural and optical properties of MgxAl1-xHy gradient thin films: a combinatorial approach. Appl. Phys. A 84, 77–85 (2006). https://doi.org/10.1007/s00339-006-3579-z
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1007/s00339-006-3579-z