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The online version of the original article can be found at http://dx.doi.org/10.1007/s00339-004-3019-x
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Novkovski, N., Atanassova, E. Erratum to: Dielectric properties of Ta2O5 films grown on silicon substrates plasma nitrided in N2O. Appl. Phys. A 81, 1511–1512 (2005). https://doi.org/10.1007/s00339-005-3318-x
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DOI: https://doi.org/10.1007/s00339-005-3318-x