Low-n mesoporous silica films: structure and properties

Abstract

The properties and structure of mesoporous silica films are investigated. Because of their extremely low refractive index (n=1.14), these films are interesting optical waveguide supports. The films have been synthesized by a template-modified sol–gel process using the triblock copolymer Pluronic P123. A significant dependence of the formed structure on the processing conditions has been revealed, allowing an appreciable structure tuning. One set of processing conditions allows the reproducible synthesis of low-n films. They are optically clear, mechanically and chemically resistant, extremely smooth, and sufficiently thick (1 μm). Under other processing conditions a novel mesoporous layer structure was synthesized that has very large and well-defined nanoscopic voids.

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Correspondence to F. Marlow.

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PACS

61.30.Pa; 68.37.Ps; 78.20.Ci

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Konjhodzic, D., Bretinger, H., Wilczok, U. et al. Low-n mesoporous silica films: structure and properties. Appl. Phys. A 81, 425–432 (2005). https://doi.org/10.1007/s00339-005-3244-y

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Keywords

  • Thin Film
  • Refractive Index
  • Operating Procedure
  • Electronic Material
  • Processing Condition