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Real-time and in-situ structural design of functional NiTi SMA thin films

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Abstract

The real-time structural design of magnetron sputtered NiTi SMA (shape memory alloy) thin films is reported. During deposition the phase content was followed in-situ by synchrotron X-ray diffraction and controlled by varying the power of co-sputtering NiTi plus Ti for otherwise fixed deposition parameters. This method allows an optimization of the thin film in respect to its functional properties like phase transition temperature or adhesion, as well as an understanding of the actual growth process by revealing temporary intermediate growth states (different phases and precipitates) and diffusion processes during film growth.

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Authors and Affiliations

  1. Institute of Ion Beam Physics and Materials Research, Forschungszentrum Rossendorf, P.O. Box 510119, 01314, Dresden, Germany

    N. Schell & R.M.S. Martins

  2. CENIMAT, Campus da FCT/UNL, 2829-516, Monte de Caparica, Portugal

    F.M. Braz Fernandes

Authors
  1. N. Schell
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  2. R.M.S. Martins
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  3. F.M. Braz Fernandes
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Correspondence to N. Schell.

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PACS

81.15.Cd; 61.10.Nz; 68.55.Jk

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Schell, N., Martins, R. & Braz Fernandes, F. Real-time and in-situ structural design of functional NiTi SMA thin films. Appl. Phys. A 81, 1441–1445 (2005). https://doi.org/10.1007/s00339-004-3201-1

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  • DOI: https://doi.org/10.1007/s00339-004-3201-1

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