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Growth of β-Ga2O3 nanoparticles by pulsed laser ablation technique

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Abstract

This work investigates pulsed laser ablation for Ga2O3 nanoparticles. Nanoparticles with diameters of 10 to 500 nm were deposited on silicon substrates in large quantities, by KrF excimer laser ablation of a GaN (99.99% purity) target in high purity nitrogen (99.9995%) background gas at room temperature, without a catalyst. The particle size and phase structure of the as-deposited nanoparticles are examined by X-ray diffraction (XRD), field emission scanning electron microscope (FE-SEM), transmission electron microscope (TEM), and selected-area electron diffraction (SAD). FE-SEM images show that the nanoparticles aggregate to form micron-size nanoclusters at chamber pressures of 1 and 5 Torr. On the other hand, nanoparticles aggregate with chain-like nanostructures, are synthesized at high chamber pressures (≥10 Torr). TEM images further reveal that chain-like nanostructures are formed by the aggregation of individual spherical and ellipsoidal nanoparticles. Photoluminescence measurement shows stable and broad blue emission at 445 nm.

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Correspondence to M.H. Hong.

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81.20.-N; 81.15.Fg; 75.50.Vv

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Lam, H., Hong, M., Yuan, S. et al. Growth of β-Ga2O3 nanoparticles by pulsed laser ablation technique. Appl. Phys. A 79, 2099–2102 (2004). https://doi.org/10.1007/s00339-004-2893-6

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  • DOI: https://doi.org/10.1007/s00339-004-2893-6

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