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Surface plasmon resonance of sputtered Ag films: substrate and mass thickness dependence

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Abstract

The influence of substrate on the tunability of the localized surface plasmon resonance wavelength, λSPR, of silver island films was investigated by magnetron sputtering the films on various substrates. It reveals that increasing refractive index of the substrate, nsub, not only leads to redshift, but also an extension of the tunable range in λSPR. Such effects can be greatly enhanced by increasing the mass thickness of the metallic islands. The resonance wavelength of an island film can be readily adjusted from the visible to the near infrared region of the electromagnetic spectrum. The sensitivity factor, ΔλSPR/Δεav, where εav is the interisland dielectric constant, was found to increase approximately linearly with the silver mass thickness up to 4 nm, from 60 nm to about 160 nm per dielectric constant unit.

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Authors and Affiliations

  1. National Institute of Advanced Industrial Science and Technology, 2266-98 Shidami, Moriyama-ku, Nagoya, 463-8560, Japan

    G. Xu, M. Tazawa, P. Jin & S. Nakao

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  1. G. Xu
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  2. M. Tazawa
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  3. P. Jin
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  4. S. Nakao
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Correspondence to M. Tazawa.

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PACS

61.46.+w; 81.07.-b; 36.40.GK

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Xu, G., Tazawa, M., Jin, P. et al. Surface plasmon resonance of sputtered Ag films: substrate and mass thickness dependence. Appl. Phys. A 80, 1535–1540 (2005). https://doi.org/10.1007/s00339-003-2395-y

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  • DOI: https://doi.org/10.1007/s00339-003-2395-y

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