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Applied Physics A

, Volume 77, Issue 3–4, pp 391–394 | Cite as

157-nm laser micromachining of N-BK7 glass and replication for microcontact printing

  • P.E. Dyer
  • S.M. Maswadi
  • C.D. Walton
  • M. Ersoz
  • P.D.I. Fletcher
  • V.N. Paunov
Regular Paper

Abstract

We report etch-rate and probe-beam-deflection studies of N-BK7 glass ablated using a 157-nm F2 laser. It is found that controllable material removal at the nanometre level is possible above an ablation threshold of 250 mJ cm-2. Contact mask printing shows well-defined features can be micromachined in this glass with sub-micron resolution capability. Micro-features produced in this way have been replicated by polydimethylsiloxane (PDMS) moulding and the stamps used to print arrays of fluorescent molecules with sub-micron fidelity.

Keywords

PDMS Polydimethylsiloxane Material Removal Controllable Material Ablation Threshold 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer-Verlag 2003

Authors and Affiliations

  • P.E. Dyer
    • 1
  • S.M. Maswadi
    • 1
  • C.D. Walton
    • 1
  • M. Ersoz
    • 2
  • P.D.I. Fletcher
    • 2
  • V.N. Paunov
    • 2
  1. 1.Dept. of PhysicsUniversity of HullHull UK
  2. 2.Dept. of ChemistryUniversity of HullHull UK

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